Camera-assisted two dimensional keystone correction
A system and method for facilitating keystone correction in a given model of projector having an attached camera is disclosed. System calibration determines intrinsic and extrinsic parameters of the projector and camera; then control points are identified within a three-dimensional space in front of a screen. The three-dimensional space defines a throw range and maximum pitch and yaw offsets for the projector/screen combination. At each control point, the projector projects a group of structured light elements on the screen and the camera captures an image of the projected pattern. These images are used to create three-dimensional look-up tables that identify a relationship between each image and at least one of (i) pitch and yaw offset angles for the respective control point and (ii) a focal length and a principal point for the respective control point. The given model projectors use the tables in effectuating keystone correction.
1. A method for effecting keystone correction on a projector, the method comprising:
using a given model of projector that has a camera attached thereto in a known relationship to project a group of structured light elements on a screen;
capturing the projected group of structured light elements using the camera;
in response to the projected group of structured light elements as captured by the camera, determining a position of an optical zoom control knob on the given model of projector;
retrieving a focal length and a principal point of the given model of projector from a plurality of three-dimensional look-up tables (LUTs) stored on the given model of projector, corresponding to the position of the optical zoom control knob; and
determining a pitch offset angle and a yaw offset angle between the given model of projector and the screen to effectuate keystone correction.
2. The method of claim 1 wherein the structured light elements are sparse elements chosen from a group comprising Gaussians, circles and lines.
3. The method of claim 1 wherein determining the pitch offset angle and the yaw offset angle between the given model of projector and the screen comprises using ray intersection techniques.
4. The method of claim 1 further comprising providing the pitch offset angle and the yaw offset angle to an integrated circuit that performs keystone correction of an image projected by the given model of projector based on the pitch offset angle and the yaw offset angle.
5. A method for effecting keystone correction on a projector, the method comprising:
using a given model of projector that has a camera attached thereto in a known relationship to project a group of structured light elements on a screen;
capturing the projected group of structured light elements using the camera;
determining a shape of the projected group of structured light elements as captured by the camera;
searching for a statistical match to the shape in a plurality of three-dimensional look-up tables (LUTs) stored on the given model of projector, and using the statistical match to determine an effective focal length and a principal point of the given model of projector; and
determining a pitch offset angle and a yaw offset angle between the given model of projector and the screen to effectuate keystone correction.
6. The method of claim 5 wherein the searching and using comprises:
using the projected group of structured light elements as captured by the camera to determine an approximate distance between the given model of projector and the screen using ray intersection methods;
locating a first three-dimensional LUT that is associated with a first distance closest to the approximate distance but less than or equal to the approximate distance, and locating a second three-dimensional LUT that is associated with a second distance closest to the approximate distance but greater than or equal to the approximate distance;
determining an expected area of a quadrilateral bounded by known points in the projected group of structured light elements, determining an actual area of the quadrilateral bounded by known points in the projected group of structured light elements as captured by the camera, and determining a difference between the expected area and the actual area expressed as a percentage of the total possible change in area from a smallest value to a largest value; and
using the difference to access the LUTs to determine the effective focal length and the principal point.
7. The method of claim 5 wherein the structured light elements are sparse elements chosen from a group comprising Gaussians, circles and lines.
8. The method of claim 5 wherein determining the pitch offset angle and the yaw offset angle between the given model of projector and the screen comprises using ray intersection techniques.
9. The method of claim 5 further comprising providing the pitch offset angle and the yaw offset angle to an integrated circuit that performs keystone correction of an image projected by the given model of projector based on the pitch offset angle and the yaw offset angle.
10. An integrated circuit (IC) for effecting keystone correction on a projector, the IC comprising circuitry to perform a method comprising:
using a given model of projector that has a camera attached thereto in a known relationship to project a group of structured light elements on a screen;
capturing the projected group of structured light elements using the camera;
in response to the projected group of structured light elements as captured by the camera, determining a position of an optical zoom control knob on the given model of projector;
retrieving a focal length and a principal point of the given model of projector from a plurality of three-dimensional look-up tables (LUTs) stored on the given model of projector, corresponding to the position of the optical zoom control knob; and
determining a pitch offset angle and a yaw offset angle between the given model of projector and the screen to effectuate keystone correction.
11. The IC of claim 10 wherein the circuitry to perform the method comprises a memory, a microprocessor and the LUTs.
12. The IC of claim 10 wherein determining the pitch offset angle and the yaw offset angle comprises using ray intersection techniques.
13. The IC of claim 10 wherein the structured light elements are sparse elements chosen from a group comprising Gaussians, circles and lines.
14. The IC of claim 10 , further comprising circuitry to perform keystone correction of an image projected by the given model of projector based on the pitch offset angle and the yaw offset angle.
15. An integrated circuit (IC) for effecting keystone correction on a projector, the IC comprising circuitry to perform a method comprising:
using a given model of projector that has a camera attached thereto in a known relationship to project a group of structured light elements on a screen;
capturing the projected group of structured light elements using the camera;
determining a shape of the projected group of structured light elements as captured by the camera;
searching for a statistical match to the shape in a plurality of three-dimensional look-up tables (LUTs) stored on the given model of projector, and using the statistical match to determine an effective focal length and a principal point of the given model of projector; and
determining a pitch offset angle and a yaw offset angle between the given model of projector and the screen to effectuate keystone correction.
16. The IC of claim 15 wherein the searching and using comprises:
using the projected group of structured light elements as captured by the camera to determine an approximate distance between the given model of projector and the screen using ray intersection methods;
locating a first three-dimensional LUT that is associated with a first distance closest to the approximate distance but less than or equal to the approximate distance, and locating a second three-dimensional LUT that is associated with a second distance closest to the approximate distance but greater than or equal to the approximate distance;
determining an expected area of a quadrilateral bounded by known points in the projected group of structured light elements, determining an actual area of the quadrilateral bounded by known points in the projected group of structured light elements as captured by the camera, and determining a difference between the expected area and the actual area expressed as a percentage of the total possible change in area from a smallest value to a largest value; and
using the difference to access the LUTs to determine the effective focal length and the principal point.
17. The IC of claim 15 wherein the circuitry to perform the method comprises a memory, a microprocessor and the LUTs.
18. The IC of claim 15 wherein determining the pitch offset angle and the yaw offset angle comprises using ray intersection techniques.
19. The IC of claim 15 wherein the structured light elements are sparse elements chosen from a group comprising Gaussians, circles and lines.
20. The IC of claim 15 , further comprising circuitry to perform keystone correction of an image projected by the given model of projector based on the pitch offset angle and the yaw offset angle.