Electrooptical device, method for manufacturing electrooptical device, and electronic apparatus

1. An electrooptical device comprising:

a substrate;

a mirror that is arranged so as to be separated from the substrate on one plane of the substrate; and

a supporting portion that is arranged between the substrate and the mirror, and has a portion which is connected to a portion of the mirror so as to support the mirror,

wherein the mirror includes

a reflective metal film that is arranged on a side of the mirror which is opposite to the substrate,

a high melting point metal film that is arranged between the reflective metal film and the substrate, and

an antioxidative film that is arranged between the high melting point metal film and the substrate, and

wherein

the reflective metal film and the antioxidative film include a same material, and

the high melting point metal film is thinner than the reflective metal film and the antioxidative film.

2. The electrooptical device according to claim 1 ,

wherein the high melting point metal film is titanium, or a titanium nitride.

3. The electrooptical device according to claim 1 ,

wherein the reflective metal film is aluminum.

4. The electrooptical device according to claim 1 ,

wherein the antioxidative film comprises aluminum.

5. An electronic apparatus comprising:

the electrooptical device according to claim 1 .

6. An electronic apparatus comprising:

the electrooptical device according to claim 2 .

7. An electronic apparatus comprising:

the electrooptical device according to claim 3 .

8. An electronic apparatus comprising:

the electrooptical device according to claim 4 .

9. The electrooptical device according to claim 1 , wherein a thickness of the high melting point metal film is about 200 Å.