IP Library Granted Patent US 9,809,454
Granted Patent B2
US 9,809,454 · App. 14/873,380 · Granted Nov 7, 2017

Method for refining hydrogen

Inventors: Yoshinao Komiya (Hiratsuka, JP); Satoshi Arakawa (Hiratsuka, JP); Toshio Akiyama (Atsugi, JP); Yasuo Sato (Chigasaki, JP); Noboru Takemasa (Hadano, JP)
Assignee: JAPAN PIONICS CO., LTD.
C01B3/505B01D53/00B01D53/228B01D2256/16C01B2203/0233C01B2203/043C01B2203/0405C01B2203/046C01B2203/1211C01B2203/1223C01B2203/1241C01B2203/1247
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Quick Facts
Patent No.
US 9,809,454
App. No.
14/873,380
Granted
Nov 7, 2017
Kind
B2
Abstract

The present invention is to provide a method for refining hydrogen with a hydrogen refining device in which the inside of a cell is divided into a primary side space and a secondary side space by palladium alloy capillaries each having one end being closed and a tube sheet supporting the open end of the palladium alloy capillaries, in which impurity-containing hydrogen is introduced from the primary side space to allow hydrogen to permeate the palladium alloy capillaries so as to collect pure hydrogen from the secondary side space. The method for refining hydrogen has a capability of decreasing the removed amount of gas containing impurities and efficiently collecting pure hydrogen from the secondary side space. From hydrogen with 1000 ppm or less of impurities as raw material hydrogen, gas containing impurities that does not penetrate the palladium alloy capillaries is removed from the primary side space at the flow rate of 10% or less of the introduction flow rate of the raw material hydrogen. Furthermore, gas containing impurities that does not penetrate the palladium alloy capillaries is removed from the primary side space at a flow rate based on the content of impurities contained in raw material hydrogen.

Claims (4)

1. A method for refining hydrogen, comprising: introducing raw material hydrogen containing impurities to the primary side space of a cell divided into a primary side space and a secondary side space by a plurality of palladium alloy capillaries each having one end being closed and a tube sheet supporting the palladium alloy capillaries at the open end of the palladium alloy capillaries; allowing hydrogen to permeate the palladium alloy capillaries so as to collect pure hydrogen from the secondary side space; and removing gas containing impurities that does not penetrate the palladium alloy capillaries from the primary side space at the flow rate of from 0.00002 to 0.0002 times of the value ab calculated by multiplying the introduction flow rate a of the raw material hydrogen by the content b (ppm) of the impurities contained in the raw material hydrogen.

2. The method according to claim 1 , wherein the raw material hydrogen contains 1000 ppm or more of impurities.

3. The method according to claim 1 , wherein the pressure difference between the primary side space and the secondary side space is set to from 0.5 to 2 MPa.

4. The method according to claim 1 , wherein the temperature difference between the gas at a raw material hydrogen inlet and the gas at an impurity-containing gas outlet is set to 50° C. or less.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 2, 2015
From: KOMIYA, YOSHINAO; ARAKAWA, SATOSHI; AKIYAMA, TOSHIO; SATO, YASUO; TAKEMASA, NOBORU
To: JAPAN PIONICS CO., LTD.
Reel/Frame 036711/0698 →
Priority Claims (2)
JP 2014-217191 · Oct 24, 2014 · national
JP 2014-233363 · Nov 18, 2014 · national
Continuity (1)
Related Publication 20160115022A1 · Apr 28, 2016