Electrostatic chuck
An electrostatic chuck is disclosed. In one aspect, the electrostatic chuck includes a top plate, wherein first and second regions adjacent to each other are formed at a surface of the top plate. The electrostatic chuck also includes a first absorption plate positioned at the first region and a second absorption plate positioned at the second region to be separated from the first absorption plate. The first and second absorption plates are configured to support the absorption target.
1. An electrostatic chuck comprising:
a top plate, wherein first and second regions adjacent to each other are formed at a surface of the top plate;
a first absorption plate positioned at the first region; and
a second absorption plate positioned at the second region to be separated from the first absorption plate,
wherein the first and second absorption plates are configured to support an absorption target,
wherein the first absorption plate includes a first portion and a second portion, wherein the first portion is configured to at least partially rotate, wherein the second portion is configured to support the first portion while the first portion is being rotated,
wherein the second absorption plate includes a third portion and a fourth portion different from each other, wherein the third portion is configured to at least partially rotate, and wherein the fourth portion is configured to support the third portion while the third portion is being rotated.
2. The electrostatic chuck of claim 1 , wherein the first and second regions are divided with reference to the center of the surface of the top plate.
3. The electrostatic chuck of claim 2 , wherein a gap is formed between the first and second absorption plates such that the center of the surface of the top plate is not covered by the first and second absorption plates.
4. A The electrostatic chuck of claim 1 , wherein the first absorption plate includes a first rotation axis connecting between the first portion and the second portion.
5. A The electrostatic chuck of claim 4 , wherein the first rotation axis is formed to be adjacent to an end of the first absorption plate.
6. A The electrostatic chuck of claim 1 , wherein the first absorption plate includes a first stopper configured to set a range of the rotation of the first portion.
7. The electrostatic chuck of claim 6 , wherein the first stopper is formed on the first portion of the first absorption plate.
8. The electrostatic chuck of claim 7 , wherein the first stopper is formed to be adjacent to the center of the surface of the top plate.
9. A The electrostatic chuck of claim 1 , wherein the second absorption plate includes a second rotation axis connecting between the third portion and fourth portion.
10. A The electrostatic chuck of claim 1 , wherein the second absorption plate includes a second stopper configured to set a range of the rotation of the third portion.
11. The electrostatic chuck of claim 10 , wherein the second stopper is formed on the third portion.
12. The electrostatic chuck of claim 11 , wherein the second stopper is formed to be adjacent to the center of the surface of the top plate.
13. The electrostatic chuck of claim 1 , wherein the absorption target is a glass substrate.
14. The electrostatic chuck of claim 1 , wherein the combined length of the first and second absorption plates is less than that of the top plate.
15. The electrostatic chuck of claim 1 , wherein the length of each of the first and second absorption plates is less than half that of the top plate.
16. The electrostatic chuck of claim 1 , wherein the top plate is thicker than each of the first and second absorption plates.
17. An electrostatic chuck comprising:
a main plate including a surface, wherein the surface is divided into first and second regions neighboring each other;
a first absorption plate positioned at the first region; and
a second absorption plate positioned at the second region to be separated from the first absorption plate,
wherein the first and second absorption plates are configured to support an absorption target, and wherein at least one of the first and second absorption plates is configured to at least partially rotate,
wherein the first absorption plate includes a first portion and a second portion wherein the first portion is configured to at least partially rotate, wherein the second portion is configured to support the first portion while the first portion is being rotated,
wherein the second absorption plate includes a third portion and a fourth portion different from each other, wherein the third portion is configured to at least partially rotate, and wherein the fourth portion is configured to support the third portion while the third portion is being rotated.