Semiconductor devices and methods of manufacturing the same

1. An integrated circuit device, comprising:

a substrate including a first region and a second region;

a first transistor in the first region, the first transistor being an N-type transistor and including:

a first P-type well in the substrate,

a first silicon-germanium layer on the substrate, and

a first gate electrode on the first silicon-germanium layer, the first silicon-germanium layer being between the first P-type well and the first gate electrode,

wherein a highest P-type impurities concentration within the first silicon-germanium layer is at an interface between the first silicon-germanium layer and the first P-type well; and

a second transistor in the second region and including a second gate electrode, the second transistor not having a silicon-germanium layer between the substrate and the second gate electrode.

2. The device as claimed in claim 1 , wherein the first transistor further comprises a silicon capping layer between the first silicon-germanium layer and the first gate electrode.

3. The device as claimed in claim 2 , wherein a P-type impurity concentration of the silicon capping layer is less than a P-type impurity concentration of the first P-type well.

4. The device as claimed in claim 1 , wherein the first transistor further comprises source/drain extension regions at opposite sides of the first gate electrode, and source/drain regions at opposite sides of the first gate electrode, a depth of each of the source/drain extension regions being greater than a depth of each of the source/drain regions.

5. The device as claimed in claim 1 , wherein the second transistor is a P-type transistor including source/drain extension regions at opposite sides of the second gate electrode, and source/drain regions at opposite sides of the second gate electrode, a depth of each of the source/drain extension regions being greater than a depth of each of the source/drain regions.

6. The device as claimed in claim 5 , further comprising a third transistor in a third region of the substrate, the third transistor being a P-type transistor,

wherein the third transistor includes a second silicon-germanium layer on the substrate, a second P-type well in the substrate with a smaller depth than the first P-type well, and a third gate electrode on the second silicon-germanium layer, and

wherein an operating voltage level of the second transistor is greater than an operating voltage level of the third transistor.

7. The device as claimed in claim 1 , wherein the second transistor is an N-type transistor, an operating voltage level of the first transistor being different from an operating voltage level of the second transistor.

8. The device as claimed in claim 7 , wherein:

the first transistor further comprises a first gate insulation layer between the first gate electrode and the first silicon-germanium layer,

the second transistor further comprises a second gate insulation layer between the second gate electrode and the substrate, and

a thickness of the first gate insulation layer is greater than a thickness of the second gate insulation layer.

9. The device as claimed in claim 7 , wherein the second transistor further comprises source/drain extension regions at opposite sides of the second gate electrode, and source/drain regions at opposite sides of the second gate electrode, a depth of each of the source/drain extension regions being less than a depth of each of the source/drain regions.

10. An integrated circuit device, comprising:

a substrate including a first region and a second region;

a first transistor in the first region, the first transistor being an N-type transistor and including:

a first silicon-germanium layer on the substrate, and

a first gate electrode on the first silicon-germanium layer;

a second transistor in the second region and including a second gate electrode, a width of the first gate electrode being greater than a width of the second gate electrode; and

a third transistor in a third region of the substrate, the third transistor being a P-type transistor, and only one of the second and third transistors including an additional silicon-germanium layer on the substrate.

11. The device as claimed in claim 10 , wherein:

the first transistor further comprises a first gate insulation layer between the first gate electrode and the first silicon-germanium layer,

the second transistor further comprises a second gate insulation layer between the second gate electrode and the substrate, and

a thickness of the first gate insulation layer is greater than a thickness of the second gate insulation layer.

12. The device as claimed in claim 10 , wherein the second transistor is a P-type transistor, the second transistor further including the additional silicon-germanium layer between the substrate and the second gate electrode.

13. The device as claimed in claim 12 ,

wherein the third transistor includes a third gate electrode on the substrate, a width of the third gate electrode being greater than a width of the second gate electrode, and

wherein the third transistor does not include the additional silicon-germanium layer between the substrate and the third gate electrode.

14. The device as claimed in claim 10 , wherein the second transistor is an N-type transistor, the second transistor not including the additional silicon-germanium layer between the substrate and the second gate electrode.

15. The device as claimed in claim 14 ,

wherein the third transistor includes:

the additional silicon-germanium layer on the substrate; and

a third gate electrode on the additional silicon-germanium layer.

16. The device as claimed in claim 10 , wherein:

the first transistor further comprises first source/drain extension regions at opposite sides of the first gate electrode, and first source/drain regions at opposite sides of the first gate electrode,

the second transistor further comprises second source/drain extension regions at opposite sides of the second gate electrode and second source/drain regions at opposite sides of the second gate electrode,

a depth of each of the first source/drain extension regions is greater than a depth of each of the first source/drain regions, and

a depth of each of the second source/drain extension regions is less than a depth of each of the second source/drain regions.

17. The device as claimed in claim 10 , wherein the first region is a high voltage transistor region and the second region is a low voltage transistor region.

18. An integrated circuit device, comprising:

a substrate including a first region and a second region;

a first transistor in the first region, the first transistor being an N-type transistor and including:

a first doped well within the substrate,

a first gate electrode on the substrate, and

a first silicon-germanium layer between the first gate electrode and the substrate; and

a second transistor in the second region and including a second gate electrode on a second doped well, a distance between a bottom of the second gate electrode and a top of the substrate being smaller than a distance between a bottom of the first gate electrode and the top of the substrate, and a depth of the first doped well being larger than a depth of the second doped well.

19. The device as claimed in claim 18 , wherein:

the first transistor further comprises a capping layer and a first gate insulating layer, the first doped well, the first silicon-germanium layer, the capping layer, and the first gate insulating layer being stacked on the substrate in the stated order, and

the second transistor further comprises a second gate insulating layer directly between the second gate electrode and the substrate.