Electro-optic apparatus, method of manufacturing electro-optic apparatus, and electronic apparatus

1. An electro-optic apparatus comprising:

a substrate that includes a first edge provided with connection terminals;

a light-emitting element that is provided at a first area of the substrate;

a guard line that is provided to surround the first area;

a plurality of wiring layers that are provided above the substrate, the guard line including wirings and contact parts that are respectively provided in a frame shape on at least two wiring layers of the plurality of wiring layers;

a sealing film that is directly formed on a cathode of the light-emitting element and covers the first area and reaches the guard line in edges except for the first edge, the sealing film being a transparent sealing film;

a color filter disposed on the sealing film; and

a resin layer that is directly formed on the color filter in the first area, and on the sealing film in an area between the first area and the guard line, and reaches the guard line.

2. The electro-optic apparatus according to claim 1 ,

wherein the sealing film is provided to reach the guard line in at least one edge of the substrate.

3. The electro-optic apparatus according to claim 1 ,

wherein the substrate is a semiconductor substrate, and

wherein the guard line is electrically connected to the semiconductor substrate.

4. The electro-optic apparatus according to claim 3 ,

wherein a predetermined potential is supplied to the guard line.

5. The electro-optic apparatus according to claim 1 ,

wherein the light-emitting element is an organic electroluminescence element.

6. An electronic apparatus which includes the electro-optic apparatus according to claim 1 .

7. An electronic apparatus which includes the electro-optic apparatus according to claim 2 .

8. An electronic apparatus which includes the electro-optic apparatus according to claim 3 .

9. An electronic apparatus which includes the electro-optic apparatus according to claim 4 .

10. The electro-optic apparatus according to claim 1 ,

wherein the sealing film includes a first sealing film and a second sealing film.

11. The electro-optic apparatus according to claim 10 ,

wherein the thickness of the first sealing film is 200 nm to 400 nm.

12. The electro-optic apparatus according to claim 10 ,

wherein the thickness of the second sealing film is 200 nm to 700 nm.

13. The electro-optic apparatus according to claim 10 ,

wherein the second sealing film includes at one of silicon oxide, silicon nitride, silicon oxide nitride, or titanium nitride.

14. An electronic apparatus which includes the electro-optic apparatus according to claim 10 .

15. An electronic apparatus which includes the electro-optic apparatus according to claim 11 .

16. The electro-optic apparatus according to claim 10 ,

wherein a buffer layer is interposed between the first sealing film and the second sealing film.

17. A method of manufacturing an electro-optic apparatus that includes a substrate that includes a first edge provided with connection terminals, a light-emitting element which is provided at a first area of the substrate, and a sealing film or a sealing structure which seals the light-emitting element, the method comprising:

forming a guard line so as to surround the first area;

forming a plurality of wiring layers above the substrate, the guard line including wirings and contact parts that are respectively formed in a frame shape on at least two wiring layers of the plurality of wiring layers;

forming the sealing film directly on a cathode of the light-emitting element so as to cover the first area and to reach the guard line in edges except for the first edge, the sealing film being a transparent sealing film;

forming a color filter on the sealing film;

forming a resin layer on the color filter in the first area, and on the sealing film in an area between the first area and the guard line, and reaching the guard line.