Method and apparatus for forming fine scale structures in dielectric substrate
Apparatus and methods for forming fine scale structures ( 4, 4′, 4″, 5, 6, 7, 8 ) in the surface of a dielectric substrate ( 3 ) to two or more depths are disclosed. In an example, the apparatus comprises a first solid state laser ( 12 ) arranged to provide a first pulsed laser beam ( 13 ), a first mask ( 16 ) having a pattern for defining a first set of structures ( 4, 6, 7, 8 ) at a first depth, a projection lens ( 17 ) for forming a reduced size image of said pattern on the surface ( 3 ) of the substrate and a beam scanner arranged to scan said first pulsed laser beam ( 13 ) in a two-dimensional raster scan relative to the first pattern to form a first set of structures ( 4, 6, 7, 5 ) at a first depth in the substrate, wherein the first or a further solid state laser is arranged to form a second set of structures ( 8 ) at a second depth in the substrate ( 3 ).
1. A method of forming fine scale structures in the surface of a dielectric substrate to two or more depths, the method comprising a two-stage process:
a first process which defines a first set of structures at a first depth and a second process which defines a second set of structures at a second depth, the first process comprising: using a first solid state laser to provide a first pulsed laser beam;
providing a first mask having a pattern for defining a first set of structures at a first depth, providing a projection lens for forming a reduced size image of said pattern on the surface of the substrate and scanning said first pulsed laser beam in a two-dimensional raster scan relative to said mask to form a first set of structures at a first depth in the substrate, the second process comprising use of the first or a further solid state laser to form a second set of structures at a second depth in the substrate, in which the first and second processes can be carried out in either order.
2. The method as claimed in claim 1 in which the second process comprises use of the first solid state laser using different laser parameters to those used in the first process.
3. The method as claimed in claim 1 in which the second process comprises use of the first solid state laser and a second mask for defining a second set of features at a second depth in the substrate, the second mask being inter-changed with the first mask.
4. The method as claimed in claim 1 in which the second process comprises using the first solid state laser to fire a number of laser pulses at the substrate whilst the substrate is stationary to form a second set of features at a second depth in the substrate.
5. The method as claimed in claim 1 in which the second process comprises use of an aperture in the first laser beam so the aperture is imaged onto the first mask and the first laser used to form a second set of features at a second depth in the substrate.
6. The method as claimed in claim 1 in which the second process comprises use of a second solid state laser which is different from the first solid state laser, the second laser being scanned over the first mask so as to form a second set of features at a second depth in the substrate.
7. The method as claimed in claim 1 in which the first, second or a further solid state laser is used to form a third set of structures at a third depth in the substrate.