Touch panel, method of producing the same, optical thin film substrate and method of producing the same

1. A touch panel comprising:

a cover substrate;

a connector being provided on an area of the cover substrate other than a display area, and comprising a color layer and a shield layer, the shield layer being formed from a multilayer structure, shielding visible light, and not shielding radio waves, the multilayer structure being configured so that a plurality of metal layers and a plurality of dielectric layers which is thicker than the metal layer are alternately laminated; and

a touch panel substrate being arranged to face the cover substrate with the connector interposed therebetween, wherein

the multilayer structure is configured such that each metal layer has a thickness of 0.5 nm to 5 nm, each dielectric layer has a thickness of 1 nm to 10 nm, which is 2 to 10 times that of each metal layer, a total thickness of the metal layers is equal to or greater than 50 nm, and a total thickness of the dielectric layers is equal to or greater than 200 nm, and

the color layer, the shield layer, and the touch panel substrate are laminated on the cover substrate in this order.

2. The touch panel according to claim 1 , wherein

the color layer is formed from a multilayer structure configured so that a high refractive index layer and a low refractive index layer are alternately laminated.

3. The touch panel according to claim 2 , wherein

at least one of the low refractive index layer and the high refractive index layer comprises a metal element.

4. A method of producing a touch panel, comprising:

preparing a cover substrate;

forming a color layer on an area of the cover substrate other than a display area in a vacuum:

forming a shield layer which shields visible light and does not shield radio waves on the color layer in a vacuum, the shield layer having a multilayer structure obtained by alternately laminating a plurality of dielectric layers and a plurality of metal layers so that the dielectric layer is thicker than the metal layer and setting a thickness of each metal layer to be 0.5 nm to 5 nm, a thickness of each dielectric layer to be 1 nm to 10 nm, which is 2 to 10 times that of each metal layer, a total thickness of the metal layers to be equal to or greater than 50 nm, and a total thickness of the dielectric layers to be equal to or greater than 200 nm; and

adhering a touch panel substrate onto the shield layer.

5. An optical thin film substrate, comprising:

a substrate;

a color layer being provided on the substrate; and

a shield layer being provided on the color layer and formed from a multilayer structure configured so that a plurality of metal layers and a plurality of dielectric layers which is thicker than the metal layer are alternately laminated, the shield layer shielding visible light and not shielding radio waves, wherein

the multilayer structure is configured such that each metal layer has a thickness of 0.5 nm to 5 nm, each dielectric layer has a thickness of 1 nm to 10 nm, which is 2 to 10 times that of each metal layer, a total thickness of the metal layers is equal to or greater than 50 nm, and a total thickness of the dielectric layers is equal to or greater than 200 nm, and

the color layer and the shield layer are laminated on the substrate in this order.

6. The optical thin film substrate according to claim 5 , wherein

the color layer is formed from a multilayer structure configured so that a high refractive index layer and a low refractive index layer are alternately laminated.

7. The optical thin film substrate according to claim 6 , wherein

at least one of the low refractive index layer and the high refractive index layer comprises a metal element.

8. The optical thin film substrate according to claim 5 , wherein

the substrate is a glass substrate or a resin substrate.

9. A method of producing an optical thin film substrate, comprising:

preparing a substrate;

forming a color layer on the substrate in a vacuum: and

forming a shield layer on the color layer in a vacuum, the shield layer having a multilayer structure obtained by alternately laminating a plurality of dielectric layers and a plurality of metal layers so that the dielectric layer is thicker than the metal layer which has a thickness of 0.5 nm to 5 nm and setting a thickness of each metal layer to be 0.5 nm to 5 nm, a thickness of each dielectric layer to be 1 nm to 10 nm, which is 2 to 10 times that of each metal layer, a total thickness of the metal layers to be equal to or greater than 50 nm, and a total thickness of the dielectric layers to be equal to or greater than 200 nm.