IP Library Granted Patent US 9,892,844
Granted Patent B2
US 9,892,844 · App. 14/822,440 · Granted Feb 13, 2018

Coil unit for thin film inductor, method of manufacturing coil unit for thin film inductor, thin film inductor, and method of manufacturing thin film inductor

Inventors: Jeong Woo Park (Suwon-Si, KR); Dong Min Kim (Busan, KR)
Assignee: Samsung Electro-Mechanics Co., Ltd.
H01F27/2804H01F41/042H01F2027/2809
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Quick Facts
Patent No.
US 9,892,844
App. No.
14/822,440
Granted
Feb 13, 2018
Kind
B2
Abstract

A coil unit for a thin film inductor includes an insulating material having double insulating layers of a first and a second insulating layers; and a plurality of coil patterns formed to be embedded in the insulating material. At least one coil pattern among the coil patterns has a thickness different from a thickness of rest of the coil patterns.

Claims (18)

1. A coil unit for a thin film inductor comprising:

an insulating material having double insulating layers of a first and a second insulating layers; and

a plurality of coil patterns formed to be embedded in the insulating material,

wherein the plurality of coil patterns comprise:

a coil pattern penetrating the first insulating layer and the second insulating layer and having a thickness corresponding to a thickness of the double insulating layers; and

a coil pattern embedded in the first insulating layer or the second insulating layer and having a thickness less than a thickness of the first or second insulation layer having the coil pattern embedded therein.

2. The coil unit for a thin film inductor according to claim 1 , wherein the coil patterns include:

a first plating layer formed to be embedded in the first insulating layer; and

a second plating layer formed to be embedded in the second insulating layer.

3. The coil unit for a thin film inductor according to claim 2 , wherein the first and the second insulating layers are photosensitive insulating layers.

4. The coil unit for a thin film inductor according to claim 3 , wherein the first insulating layer is formed of a mixture of prepreg and a resin, and the second insulating layer is formed of a resin.

5. The coil unit for a thin film inductor according to claim 3 , wherein the first insulating layer is formed of a resin, and the second insulating layer is formed of a mixture of prepreg and a resin.

6. The coil unit for a thin film inductor according to claim 2 , wherein at least one of the first and the second plating layers is formed of a plurality of plating layers.

7. The coil unit for a thin film inductor according to claim 1 , further comprising insulating resist formed on an upper surface and a lower surface of the insulating material.

8. The coil unit for a thin film inductor according to claim 2 , further comprising insulating resist formed on a portion of the first plating layer exposed to a lower surface of the first insulating layer and a portion of the second plating layer exposed to an upper surface of the second insulating layer.

9. A thin film inductor comprising:

the coil unit for a thin film inductor according to claim 1 ; and

a magnetic body joined to at least one of an upper surface or a lower surface of the coil unit for a thin film inductor.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 10, 2015
From: PARK, JEONG WOO; KIM, DONG MIN
To: SAMSUNG ELECTRO-MECHANICS CO., LTD.
Reel/Frame 036292/0049 →
Priority Claims (1)
KR 10-2014-0127618 · Sep 24, 2014 · national
Continuity (1)
Related Publication 20160086721A1 · Mar 24, 2016