Metal alkoxide compound, thin-film-forming material, method for producing thin film, and alcohol compound
Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R 1 represents a methyl group or an ethyl group, R 2 represents a hydrogen atom or a methyl group, R 3 represents a C 1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.
1. A metal alkoxide compound represented by general formula (I):
In the formula, R 1 represents a methyl group or an ethyl group, R 2 represents a hydrogen atom or a methyl group, R 3 represents a C 1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.
2. The metal alkoxide compound according to claim 1 , wherein, in the general formula (I), M is copper, nickel, or cobalt.
3. The metal alkoxide compound according to claim 1 , wherein, in the general formula (I), M is copper, and R 2 is a hydrogen atom.
4. A thin-film-forming material including the metal alkoxide compound according to claim 1 .
5. A method for producing a thin film, the method comprising:
introducing, into a deposition chamber in which a substrate is placed, a vapor that has been obtained by vaporizing the thin-film-forming material according to claim 4 and that includes said metal alkoxide compound; and
forming a metal-containing thin film on a surface of the substrate by decomposing and/or chemically reacting said metal alkoxide compound.
6. A thin-film-forming material including the metal alkoxide compound according to claim 2 .
7. A thin-film-forming material including the metal alkoxide compound according to claim 3 .