EUV imaging apparatus
An EUV imaging apparatus is provided, which includes a reference structure and a first optical element, which is actuatable relative to the reference structure with the aid of a first actuator. The first actuator is a self-holding actuator. The apparatus includes a second optical element, which is actuatable relative to the reference structure a second actuator. The second actuator is a non-self-holding actuator.
1. An imaging apparatus, comprising:
a reference structure;
a first actuator;
a second actuator;
a first optical element actuatable relative to the reference structure via the first actuator; and
a second optical element actuatable relative to the reference structure via the second actuator,
wherein:
the first actuator is a self-holding actuator that is semi-actively controlled;
the second actuator is a non-self holding actuator;
the second actuator is actively controlled with the aid of a control loop; and
the imaging apparatus is an EUV imaging apparatus.
2. The imaging apparatus of claim 1 , wherein the first optical element is in a near-pupil arrangement.
3. The imaging apparatus of claim 2 , wherein the second optical element is in a near-field arrangement.
4. The imaging apparatus of claim 1 , wherein the second optical element is in a near-field arrangement.
5. The imaging apparatus of claim 1 , wherein:
the first optical element is mounted on a first support structure;
the first support structure is attached to the reference structure;
the second optical element is mounted on a second support structure; and
the second support structure is attached to the reference structure.
6. The imaging apparatus of claim 1 , further comprising a reaction mass configured to compensate forces generated during use of the imaging apparatus when actuating the second optical element.
7. The imaging apparatus of claim 1 , wherein:
the first optical element is mounted on a first support structure;
the first support structure is attached to the reference structure;
the second optical element is mounted on a second support structure; and
the second support structure is mechanically decoupled from the reference structure.
8. The imaging apparatus of claim 1 , wherein:
the imaging apparatus is configured to actuate the first actuator: a) at regular intervals to correct a location of the first actuator; orb) in response to an external signal to correct the location of the first actuator; and
the imaging apparatus is configured to correct a location of the second actuator continuously with the aid of a control loop.
9. The imaging apparatus of claim 1 , wherein the first actuator comprises an actuator selected from the group consisting of a piezoelectric actuator, a magnetostrictive actuator, and a linear motor.
10. The imaging apparatus of claim 9 , wherein the second actuator comprises a Lorentz actuator.
11. The imaging apparatus of claim 1 , wherein the second actuator comprises a Lorentz actuator.
12. The imaging apparatus of claim 1 , wherein the first optical element comprises a first mirror, and the second optical element comprises a second mirror.
13. The imaging apparatus of claim 12 , comprising near-field mirror elements mounted in an active manner.
14. The imaging apparatus of claim 13 , comprising near-pupil mirror elements mounted in a semi-active manner.
15. The imaging apparatus of claim 12 , comprising near-pupil mirror elements mounted in a semi-active manner.
16. The imaging apparatus of claim 1 , wherein an optical sensitivity of the second optical element is greater than an optical sensitivity of the first optical element.
17. The imaging apparatus of claim 1 , further comprising a first sensor device configured to determine a position of the first optical element directly on the first optical element.
18. The imaging apparatus of claim 17 , wherein the position of the first optical element is a reference for positioning the second optical element.
19. The imaging apparatus of claim 18 , further comprising a second sensor device configured to determine a position of the second optical element, wherein:
the first sensor device is configured to determine the position of the first optical element at specific time intervals or as a response to an external signal; and
the second sensor device is configured to determine the position of the second optical element continuously.
20. The imaging apparatus of claim 1 , wherein the imaging apparatus is an EUV lithography apparatus.
21. The imaging apparatus of claim 1 , wherein the imaging apparatus is a mask metrology apparatus.