Hydrofluorocarbon gas-assisted plasma etch for interconnect fabrication
In one embodiment, a method for hydrofluorocarbon gas-assisted plasma etch for interconnect fabrication includes providing a layer of a dielectric material and etching a trench in the layer of the dielectric material, by applying a mixture of an aggressive dielectric etch gas and a polymerizing etch gas to the layer of the dielectric material. In another embodiment, an integrated circuit includes a plurality of semiconductor devices and a plurality of conductive lines connecting the plurality of semiconductor devices. A pitch of the plurality of conductive lines is approximately twenty-eight nanometers.
1. A method, comprising:
providing a capping layer to separate a front end from a back end of an integrated circuit being fabricated;
providing a layer of a dielectric material directly on the capping layer, wherein the layer of the dielectric material forms a part of the back end;
etching a trench in the layer of the dielectric material, by applying a mixture of a dielectric etch gas and a polymerizing etch gas to the layer of the dielectric material, wherein a ratio of the dielectric etch gas to the polymerizing etch gas in the mixture is sufficient to line sidewalls of the trench with a passivation layer as the trench is etched, wherein the etching stops at the capping layer, and wherein the dielectric etch gas comprises a fluorocarbon gas, and the polymerizing etch gas comprises a hydrofluorocarbon gas compound;
removing the passivation layer from the sidewalls of the trench; and
depositing a conductive metal in the trench, subsequent to removing the passivation layer, to form a conductive line that directly contacts the dielectric layer.
2. The method of claim 1 , wherein the mixture comprises approximately twenty to forty parts dielectric etch gas to one part polymerizing etch gas.
3. The method of claim 1 , wherein the dielectric etch gas comprises carbon tetrafluoride.
4. The method of claim 1 , wherein the dielectric etch gas comprises sulfur hexafluoride.
5. The method of claim 1 , wherein the dielectric etch gas comprises nitrogen trifluoride.
6. The method of claim 1 , wherein the polymerizing etch gas comprises perfluorocyclobutane.
7. The method of claim 1 , wherein the polymerizing etch gas comprises heptafluorocyclopentene.
8. The method of claim 1 , wherein the passivation layer protects the sidewalls from lateral etching by the dielectric etch gas.
9. The method of claim 1 , wherein the capping layer completely separates the front end from the back end.
10. A method, comprising:
providing a capping layer to separate a front end from a back end of an integrated circuit being fabricated;
providing a layer of a dielectric material directly over the capping layer, wherein the layer of the dielectric material forms a part of the back end;
providing a mask layer directly over the layer of the dielectric material;
patterning the mask layer to expose portions of the layer of the dielectric material;
etching the portions of the layer of the dielectric material to form a plurality of trenches, wherein the etching is performed using a mixture of a dielectric etch gas and a polymerizing etch gas, wherein the etching stops at the capping layer, and wherein a ratio of the dielectric etch gas to the polymerizing etch gas in the mixture is sufficient to line sidewalls of the plurality of trenches with passivation layers as the plurality of trenches is etched, and wherein the dielectric etch gas comprises a fluorocarbon gas, and the polymerizing etch gas comprises a hydrofluorocarbon gas compound;
removing the passivation layers from the sidewalls of the plurality of trenches; and
filling the plurality of trenches with a conductive metal, subsequent to removing the passivation layers, to form a plurality of conductive lines that directly contact the dielectric layer.
11. The method of claim 10 , wherein the mixture comprises approximately twenty to forty parts dielectric etch gas to one part polymerizing etch gas.
12. The method of claim 10 , wherein the dielectric etch gas comprises carbon tetrafluoride.
13. The method of claim 10 , wherein the dielectric etch gas comprises nitrogen trifluoride.
14. The method of claim 10 , wherein the dielectric etch gas comprises sulfur hexafluoride (SF 6 ).
15. The method of claim 10 , wherein the polymerizing etch gas comprises heptafluorocyclopentene.
16. The method of claim 10 , wherein the polymerizing etch gas comprises perfluorocyclobutane.
17. The method of claim 10 , wherein the passivation layers protect the sidewalls from lateral etching by the dielectric etch gas.