IP Library Granted Patent US 9,952,161
Granted Patent B2
US 9,952,161 · App. 14/984,362 · Granted Apr 24, 2018

Methods for obtaining and analyzing digital interferometric data for computer testing and developing semiconductor and anisotropic devices and materials

Inventor: Paul L. Pfaff (Lake Oswego, OR)
Assignee: Attofemto, Inc.
G01N21/9505G01B9/021G01B9/02011G01B11/164G01B11/2441G01N21/1717G01N21/23G01N21/9501H01L22/12G01N2021/1721G01N2201/12
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Quick Facts
Patent No.
US 9,952,161
App. No.
14/984,362
Granted
Apr 24, 2018
Kind
B2
Abstract

An interferometric holographic instrument enables the generation of digital data for testing and enabling 2-dimensional and 3-dimensional analysis of “live” and real-time semiconductor or anisotropic devices and materials. The digitally recorded interferometric data can be displayed, stored or connected to a live data stream for transmission to digital processing devices. A digital electric processor or analyzer connected to the recording device, or live data stream, enables the interferometric data to be utilized to test, develop, and shape semiconductor and anisotropic microelectronic processing, wireless and microwave devices.

Claims (19)

1. A method of obtaining digital data for determining, shaping or testing a semiconductor or anisotropic device or materials under test comprising:

(a) providing a beam of light from a light source having a first wavelength;

(b) in a first beam instance imposing said beam of light on a test device over a spatial region within said test device substantially greater than said first wavelength, wherein said test device has a first state of refractive indexes;

(c) in a second beam instance imposing said beam of light on said test device over said spatial region within said test device, wherein said test device has a second state of refractive indexes;

(d) obtaining, displaying, transmitting, processing, or storing first electric digital data resulting from the interference of said first beam instance within said device under test representative of voltages within said region and obtaining second electric digital data resulting from the interference of said second beam instance within said device under test representative of the voltages within said region, and comparing by electric digital data processing said first and second electric digital data to determine operating characteristics within said device under test;

(e) displaying, transmitting, processing, or storing at least one of said operating characteristics; and

(f) wherein said first state of refractive indexes is at a first voltage potential or electromagnetic field state, and wherein said second state of refractive indexes is at a second voltage potential or electromagnetic field state different from said first voltage potential or electromagnetic field state.

2. A method of obtaining digital data for determining, shaping or testing a semiconductor or anisotropic device or materials under test comprising:

(a) providing a beam of light from a light source having a first wavelength;

(b) imposing said beam of light on a test device over a spatial region within said test device substantially greater than said first wavelength, wherein said test device has at least a first state of birefringence or refraction;

(c) imposing said beam of light on said test device over said spatial region within said test device, wherein said test device has at least a second state of birefringence or refraction; and

(d) obtaining, displaying, transmitting, processing, or storing electric digital data resulting from the interference of said beam of light within said device under test representative of voltages or electromagnetic field states within said region;

(e) wherein said first state of birefringence or refraction is at a first voltage potential or electromagnetic field state, and wherein said second state of birefringence or refraction is at a second voltage potential or electromagnetic field state different from said first voltage potential or electromagnetic field state.

3. A method of obtaining digital data for determining, shaping or testing a semiconductor or anisotropic device or materials device under test comprising:

(a) providing a coherent beam of light from a light source having a first wavelength;

(b) imposing said coherent beam of light on a test device over a spatial region within said test device greater than said first wavelength, wherein said test device has a first state;

(c) imposing said coherent beam of light on said test device over said spatial region within said test device, wherein said test device has a second state;

(d) obtaining, displaying, transmitting, processing, or storing electric digital data resulting from the interference of said coherent beam of light within said device under test representative of the voltages or electromagnetic field states within said region;

(e) wherein said first state is at a first voltage potential or electromagnetic field state, and wherein said second state is at a second voltage potential or electromagnetic field different from said first voltage potential or electromagnetic field state.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 19, 2016
From: PFAFF, PAUL L.
To: ATTOFEMTO, INC.
Reel/Frame 040665/0157 →
Continuity (9)
Continuation 14522334 · Oct 23, 2014
Continuation 13903232 · May 28, 2013
Continuation 13366180 · Feb 3, 2012
Continuation 12779749 · May 13, 2010
Continuation 12120924 · May 15, 2008
Continuation 11278389 · Mar 31, 2006
Continuation 10301030 · Nov 20, 2002
Provisional Application 60337419 · Dec 6, 2001
Related Publication 20160195479A1 · Jul 7, 2016