IP Library Granted Patent US 9,964,652
Granted Patent B2
US 9,964,652 · App. 15/697,162 · Granted May 8, 2018

Apparatus and method of manufacturing radiation detection panel

Inventors: Hitoshi Chiyoma (Otawara, JP); Atsuya Yoshida (Nasushiobara, JP); Wataru Matsuyama (Nasushiobara, JP); Toyoo Yamamoto (Nasushiobara, JP); Hiroshi Aida (Otawara, JP); Yuichi Shimba (Utsunomiya, JP)
Assignee: TOSHIBA ELECTRONIC TUBES & DEVICES CO., LTD.
G01T1/20C23C14/0694C23C14/225C23C14/24C23C14/505G01T1/202
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Quick Facts
Patent No.
US 9,964,652
App. No.
15/697,162
Granted
May 8, 2018
Kind
B2
Abstract

According to one embodiment, an apparatus of manufacturing a radiation detection panel, includes an evaporation source configured to evaporate a scintillator material and emit the scintillator material vertically upward, a holding mechanism located vertically above the evaporation source, and holding a photoelectric conversion substrate, and a heat conductor arranged opposite to the holding mechanism with a gap.

Claims (31)

1. An apparatus of manufacturing a radiation detection panel, comprising:

an evaporation source configured to evaporate a scintillator material and emit the scintillator material vertically upward;

a holding mechanism located vertically above the evaporation source, and holding a photoelectric conversion substrate such that a deposition surface of the photoelectric conversion substrate is exposed to the evaporation source and inclined with respect to a vertical axis; and

a driving unit attached to the holding mechanism and configured to rotate the photoelectric conversion substrate with the holding mechanism,

wherein

the evaporation source includes an evaporation port through which the scintillator material is emitted;

the holding mechanism holds the photoelectric conversion substrate such that 45°≤θ≤70° is satisfied at a center of the deposition surface, where θ is an angle made inside between an imaginary line connecting a center of the evaporation port and an arbitrary point on the deposition surface, and a normal line of the deposition surface; and

the driving unit rotates the photoelectric conversion substrate with the holding mechanism by setting a rotation axis as an axis along a normal line of the center of the deposition surface.

2. The apparatus of claim 1 , wherein

the holding mechanism holds the photoelectric conversion substrate such that 50°≤θ≤65° is satisfied at the center of the deposition surface.

3. The apparatus of claim 1 , further comprising:

a vacuum chamber containing the deposition source and the holding mechanism, and formed in a rectangular box shape, the driving unit being attached to the vacuum chamber;

wherein

the angle θ is defined on a plane parallel to a plane defined by a height and a width of the vacuum chamber; and

the vacuum chamber has a volume substantially proportional to cos θ.

4. The apparatus of claim 1 , further comprising:

another holding mechanism located vertically above the evaporation source, and holding another photoelectric conversion substrate such that another deposition surface of the another photoelectric conversion substrate is exposed to the evaporation source and inclined with respect to the vertical axis,

wherein an angle made inside between the deposition surface and the another deposition surface is an acute angle.

5. The apparatus of claim 4 , wherein

the evaporation source includes an evaporation port through which the scintillator material is emitted; and

the holding mechanism and the another holding mechanism are arranged symmetrical with respect to the vertical axis that passes through the evaporation port.

6. The apparatus of claim 1 , further comprising:

a heat conductor positioned through the holding mechanism and away from the photoelectric conversion substrate and arranged opposite to the holding mechanism with a gap.

7. The apparatus of claim 6 , wherein

the heat conductor includes an obverse surface opposing the holding mechanism and having been subjected to a blackening treatment.

8. The apparatus of claim 7 , wherein

the heat conductor includes a reverse surface subjected to the blackening treatment.

9. The apparatus of claim 7 , further comprising:

a temperature adjusting member positioned through the heat conductor and away from the holding mechanism, and configured to adjust a temperature of the photoelectric conversion substrate via the heat conductor.

10. The apparatus of claim 9 , wherein

when the scintillator material is deposited on the deposition surface, the temperature adjusting member is configured to control the temperature of the photoelectric conversion substrate within a range of 70° to 140° in an initial deposition stage, and control the temperature of the photoelectric conversion substrate within a range of 125° to 190° after the initial deposition stage.

Assignments (1)
CHANGE OF NAME Recorded Dec 11, 2018
From: TOSHIBA ELECTRON TUBES & DEVICES CO., LTD.
To: CANON ELECTRON TUBES & DEVICES CO., LTD.
Reel/Frame 047788/0490 →
Priority Claims (4)
JP 2011-276157 · Dec 16, 2011 · national
JP 2011-276158 · Dec 16, 2011 · national
JP 2011-276207 · Dec 16, 2011 · national
JP 2011-276208 · Dec 16, 2011 · national
Continuity (3)
Division 14301460 · Jun 11, 2014
Division PCTJP2012081674 · Dec 6, 2012
Related Publication 20170363752A1 · Dec 21, 2017