IP Library Granted Patent US 9,982,103
Granted Patent B2
US 9,982,103 · App. 14/411,151 · Granted May 29, 2018

Polyimide and polyimide film comprising the same

Inventors: Chul Ha Ju (Yongin-si, KR); Hyo Jun Park (Yongin-si, KR); Hak Gee Jung (Yongin-si, KR)
Assignee: KOLON INDUSTRIES, INC.
C08J5/18C08G73/1003C08K3/36C09D179/08C08J2379/08
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Quick Facts
Patent No.
US 9,982,103
App. No.
14/411,151
Granted
May 29, 2018
Kind
B2
Abstract

This invention relates to polyimide, which includes amorphous silica particles having OH groups thereon and is thus highly heat-resistant, colorless and transparent, and to a polyimide film manufactured using the polyimide.

Claims (11)

1. A polyimide, comprising amorphous silica particles having OH groups thereon,

wherein an amount of the amorphous silica particles is 0.01-0.1 parts by weight based on 100 parts by weight of the polyimide; and

wherein the polyimide is obtained by (a) providing a partially imidized polyimide resin solid; (b) mixing a dispersion of the amorphous silica and the partially imidized polyimide resin solid; and (c) subjecting the resulting mixture obtained in (b) to imidization, wherein the dispersion of the amorphous silica contains the amorphous silica in a concentration of 0.01-1.0 wt % in a solvent.

2. The polyimide of claim 1 , wherein the partially imidized polyimide resin solid is prepared by copolymerizing a dianhydride, an aromatic dicarbonyl compound and a diamine.

3. A polyimide film, comprising the polyimide of claim 1 , wherein the polyimide film has on optical transmittance of 88% or more at a wavelength of 550 nm.

4. The polyimide film of claim 3 , which has a haze of 2.0 or less.

5. The polyimide film of claim 3 , which has a coefficient of thermal expansion of 15 ppm/° C. or less at 50-250° C., and a yellow index of 7 or less.

6. The polyimide film of claim 3 , wherein the polyimide film is obtained by polymerizing a dianhydride, an aromatic dicarbonyl compound and a diamine in a first solvent to prepare a polyamic acid solution, imidizing the polyamic acid solution to prepare an imidized solution, which is then added to a second solvent, filtered and dried to obtain a polyimide resin solid, mixing the polyimide resin solid with amorphous silica particles having OH groups thereon dispersed in the first solvent to prepare a mixture, and then subjecting the mixture to a film forming process.

7. The polyimide film of claim 6 , wherein the polyimide film is obtained by performing additional thermal treatment at 300-500° C. for 1 min-3 hr, after the film forming process.

8. The polyimide film of claim 6 , wherein the first solvent is at least one selected from the group consisting of m-cresol, N-methyl-2-pyrrolidone, dimethylformamide, dimethylacetamide, dimethylsulfoxide, acetone and diethylacetate, and the second solvent is at least one selected from among water, alcohols, ethers and ketones.

9. A substrate for a display, comprising the polyimide film of claim 3 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 23, 2015
From: JU, CHUL HA; PARK, HYO JUN; JUNG, HAK GEE
To: KOLON INDUSTRIES, INC.
Reel/Frame 034799/0652 →
Priority Claims (1)
KR 10-2012-0070549 · Jun 29, 2012 · national
Continuity (1)
Related Publication 20150152232A1 · Jun 4, 2015