IP Library › Granted Patent US 1,003,553
Granted Patent S1
US 1,003,553 · App. 29/811,068 · Granted Oct 31, 2023

Polishing mat

Inventors: Anisa Telwar Kaicker (Atlanta, GA); Shuai Chen (Atlanta, GA)
Assignee: Anisa International, Inc.
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Quick Facts
Patent No.
US 1,003,553
App. No.
29/811,068
Granted
Oct 31, 2023
Kind
S1
Claims (1)

We claim the ornamental design for a polishing mat, as shown and described.

Continuity (1)
Continuation 29734143 · May 8, 2020