IP Library Granted Patent US 10,046,076
Granted Patent B1
US 10,046,076 · App. 15/785,162 · Granted Aug 14, 2018

Ultraviolet disinfection system

Inventors: Douglas A. Collins (Hayward, CA); Li Zhang (Hayward, CA); Yitao Liao (Redwood City, CA)
Assignee: RayVio Corporation
A61L2/10A61L9/20C02F1/325C02F2201/3222C02F2201/3228C02F2303/04
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,046,076
App. No.
15/785,162
Granted
Aug 14, 2018
Kind
B1
Abstract

Embodiments of the invention include an ultraviolet (UV) source, the UV source including a semiconductor device comprising an active layer disposed between an n-type region and a p-type region. The active layer emits radiation having a peak wavelength in a UV range. A reflector cup is disposed around the UV source. A transparent cover is disposed over the reflector cup.

Claims (40)

1. A structure comprising:

an ultraviolet (UV) source comprising a semiconductor device comprising an active layer disposed between an n-type region and a p-type region, wherein the active layer emits radiation having a peak wavelength in a UV range;

a reflector cup disposed around the UV source;

an optically transmissive cover disposed over the reflector cup; and

a device for adjusting a distance between the optically transmissive cover and a stage disposed beneath the optically transmissive cover; wherein the stage is a conveyor belt.

2. The structure of claim 1 wherein the optically transmissive cover has vertical sidewalls.

3. The structure of claim 1 further comprising a liquid, gel, or solid material disposed between the UV source and the optically transmissive cover.

4. The structure of claim 3 wherein the UV source comprises a growth substrate, and an index of refraction of the material is between an index of refraction of the optically transmissive cover and an index of refraction of the growth substrate.

5. The structure of claim 1 further comprising an optic disposed over the UV source.

6. The structure of claim 1 wherein a major surface of the optically transmissive cover is roughened.

7. The structure of claim 1 wherein a surface of the reflector cup facing the UV source comprises a direct, diffuse reflector.

8. The structure of claim 1 wherein the device for adjusting a distance comprises:

a sensor for detecting a distance between an object on the stage and the optically transmissive cover; and

a motor for moving one of the optically transmissive cover and the stage up or down.

9. A structure comprising:

an ultraviolet (UV) source comprising a semiconductor device comprising an active layer disposed between an n-type region and a p-type region, wherein the active layer emits radiation having a peak wavelength in a UV range;

a reflector cup disposed around the UV source, wherein a surface of the reflector cup facing the UV source comprises facets; an optically transmissive cover disposed over the reflector cup; and

a device for adjusting a distance between the optically transmissive cover and a stage disposed beneath the optically transmissive cover.

10. The structure of claim 9 wherein the stage is a conveyor belt.

11. The structure of claim 9 further comprising a liquid, gel, or solid material disposed between the UV source and the optically transmissive cover.

12. The structure of claim 9 further comprising an optic disposed over the UV source.

13. The structure of claim 9 wherein a major surface of the optically transmissive cover is roughened.

14. A structure comprising:

an ultraviolet (UV) source comprising a semiconductor device comprising an active layer disposed between an n-type region and a p-type region, wherein the active layer emits radiation having a peak wavelength in a UV range;

a reflector cup disposed around the UV source; and

an optically transmissive cover disposed over the reflector cup, wherein the optically transmissive cover is oriented to form a stage on which an object to be disinfected is placed;

wherein radiation exiting the optically transmissive cover is suitable for disinfection.

15. The structure of claim 14 further comprising a liquid, gel, or solid material disposed between the UV source and the optically transmissive cover.

16. The structure of claim 14 wherein a major surface of the optically transmissive cover is roughened.

17. The structure of claim 14 further comprising an optic disposed over the UV source.

18. A structure comprising:

an ultraviolet (UV) source comprising a semiconductor device comprising an active layer disposed between an n-type region and a p-type region, wherein the active layer emits radiation having a peak wavelength in a UV range;

a reflector cup disposed around the UV source; and

an optically transmissive cover disposed over the reflector cup, wherein the optically transmissive cover is optically coupled to a fluid and prevents the fluid from contacting the UV source;

wherein radiation exiting the optically transmissive cover is suitable for disinfection.

19. The structure of claim 18 wherein the optically transmissive cover forms a sidewall of a vessel suitable for containing the fluid.

20. The structure of claim 18 wherein the optically transmissive cover is optically coupled to a sidewall of a vessel suitable for containing the fluid.

21. The structure of claim 18 further comprising a liquid, gel, or solid material disposed between the UV source and the optically transmissive cover.

22. The structure of claim 18 further comprising an optic disposed over the UV source.

23. The structure of claim 18 wherein a major surface of the optically transmissive cover is roughened.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 9, 2021
From: RAYVIO (ABC), LLC
To: NIKKISO CO., LTD.
Reel/Frame 055193/0876 →
Continuity (1)
Continuation 15094873 · Apr 8, 2016
Cited By (1)
US 12,576,383