IP Library Granted Patent US 10,097,152
Granted Patent B2
US 10,097,152 · App. 14/653,829 · Granted Oct 9, 2018

MEMS component having AlN and Sc and method for manufacturing a MEMS component

Inventors: Gilles Moulard (Munich, DE); Paul Muralt (La Sarraz, CH); Ramin Matloub (Pully, CH)
Assignee: SnapTrack, Inc.
H03H3/04H01L41/187H01L41/29H01L41/314H01L41/332H03H3/02H03H9/02015H03H9/589H03H2003/0435H03H2003/0471
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Quick Facts
Patent No.
US 10,097,152
App. No.
14/653,829
Granted
Oct 9, 2018
Kind
B2
Abstract

A MEMS component includes a lower electrode. The MEMS component also includes an upper electrode. The upper electrode overlies the lower electrode. The MEMS component also includes a first piezoelectric layer between the lower electrode and the upper electrode. The first piezoelectric layer has a first piezoelectric material comprising AlN and Sc.

Claims (12)

1. A MEMS component comprising:

a first lower electrode on a substrate;

a first upper electrode overlying the first lower electrode;

a first piezoelectric layer between the first lower electrode and the first upper electrode, wherein the first piezoelectric layer comprises Sc-doped AlN;

a second lower electrode on the substrate;

a second upper electrode overlying the second lower electrode; and

a second piezoelectric layer between the second lower electrode and the first lower electrode, wherein the second piezoelectric layer is thicker than the first piezoelectric layer, and wherein the second piezoelectric layer has a different material composition than the first piezoelectric layer.

2. The MEMS component of claim 1 , wherein

the first lower electrode, the first piezoelectric layer and the first upper electrode form part of a first BAW resonator; and

the second lower electrode, the second upper electrode and the second piezoelectric layer form a part of a second BAW resonator.

3. The MEMS component of claim 2 , wherein the second piezoelectric layer comprises AlN.

4. The MEMS component of claim 2 , wherein the second piezoelectric layer has an etching rate for a phosphoric acid solution that is different from an etching rate of the first piezoelectric layer for the phosphoric acid solution.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 2, 2017
From: EPCOS AG
To: SNAPTRACK, INC.
Reel/Frame 041608/0145 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 7, 2015
From: MOULARD, GILLES, DR.; MURALT, PAUL, DR.; MATLOUB, RAMIN
To: EPCOS AG
Reel/Frame 036746/0127 →
Continuity (1)
Related Publication 20150333727A1 · Nov 19, 2015
Cited By (2)
US 12,334,903 US 12,669,371