IP Library Granted Patent US 10,115,451
Granted Patent B2
US 10,115,451 · App. 15/712,041 · Granted Oct 30, 2018

Memory device comprising electrically floating body transistor

Inventors: Jin-Woo Han (San Jose, CA); Neal Berger (Cupertino, CA); Yuniarto Widjaja (Cupertino, CA)
Assignee: Zeno Semiconductor, Inc.
G11C11/4096G11C11/401G11C11/4076G11C29/50H01L27/10802G11C5/06G11C8/00G11C8/10G11C8/12G11C16/0416G11C16/08G11C2211/4016
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,115,451
App. No.
15/712,041
Granted
Oct 30, 2018
Kind
B2
Abstract

A semiconductor memory instance is provided that includes an array of memory cells. The array includes a plurality of semiconductor memory cells arranged in at least one column and at least one row. Each of the semiconductor memory cells includes a floating body region configured to be charged to a level indicative of a state of the memory cell. Further includes are a plurality of buried well regions, wherein each of the buried well regions can be individually selected, and a decoder circuit to select at least one of the buried well regions.

Claims (27)

1. A method of operating an array of semiconductor memory cells, the array comprising at least two memory sub-arrays, each memory sub-array comprising:

a plurality of said semiconductor memory cells arranged in at least one column and at least one row, each said semiconductor memory cell comprising:

a floating body region configured to be charged to a level indicative of a state of the memory cell;

a first region in electrical contact with said floating body region, located at a surface of said floating body region;

a second region in electrical contact with said floating body region, located at a surface of said floating body region, spaced apart from said first region;

a gate positioned between said first region and said second region; and

a third region in electrical contact with said floating body region, located below said floating body region;

said method comprising:

selecting said third region of at least one of said semiconductor memory cells in at least one of said at least two memory sub-arrays; and

operating said at least one of said memory sub-arrays independently of operation of a remainder of said at least two memory sub-arrays not selected.

2. The method of operating an array of semiconductor memory cells of claim 1 , wherein said selecting at least one of said at least two memory sub-arrays is performed by applying a first bias condition to said at least one of said memory sub-arrays and a second bias condition to at least one of said at least two memory sub-arrays not selected, wherein said first bias condition is different from said second bias condition.

3. The method of operating an array of semiconductor memory cells of claim 1 , further comprising applying a bias to said third region within one of said at least two memory sub-arrays to maintain states of said semiconductor memory cells in said one of said at least two memory sub-arrays.

4. The method of operating an array of semiconductor memory cells of claim 1 , further comprising applying a first ramp rate for reading said state of a memory cell in said array and applying a second ramp rate for writing said state to said memory cell, wherein said first ramp rate is different from said second ramp rate.

5. The method of operating an array of semiconductor memory cells of claim 4 , wherein said first ramp rate is lower than said second ramp rate.

6. A method of operating an array of semiconductor memory cells, the array comprising a plurality of said semiconductor memory cells arranged in at least one column and at least one row, each said semiconductor memory cell comprising:

a floating body region configured to be charged to a level indicative of a state of the memory cell; and

a buried well region contacting said floating body region;

said method comprising:

selecting at least one of said at least one column or at least one row; and

selecting at least one of said buried well regions; and

disabling at least one of said plurality of said semiconductor cells not located in the at least one column or at least one row having been selected;

wherein said disabling comprises removing a bias from said buried well region contacting said floating body region of said at least one of said plurality of said semiconductor cells not located in the at least one column or at least one row having been selected.

7. The method of claim 6 , comprising maintaining a bias to said at least one of said buried well regions that was selected.

8. The method of claim 6 , further comprising performing an operation on at least one of said semiconductor memory cells having been selected by said selecting.

9. The method of claim 6 , further comprising applying a bias to said buried well region to maintain states of said semiconductor memory cells that have not been disabled.

10. The method of claim 6 , further comprising applying a first ramp rate for reading said state of a memory cell, and a second ramp rate for writing said memory cell, wherein said first ramp rate is different from said second ramp rate.

11. The method of claim 10 , wherein first ramp rate is lower than said second ramp rate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 20, 2018
From: HAN, JIN-WOO; BERGER, NEAL; WIDJAJA, YUNIARTO
To: ZENO SEMICONDUCTOR, INC.
Reel/Frame 045291/0528 →
Continuity (6)
Division 15287903 · Oct 7, 2016
Continuation 14825268 · Aug 13, 2015
Provisional Application 62058892 · Oct 2, 2014
Provisional Application 62051759 · Sep 17, 2014
Provisional Application 62038188 · Aug 15, 2014
Related Publication 20180012646A1 · Jan 11, 2018
Cited By (1)
US 12,439,611