IP Library › Granted Patent US 1,011,669
Granted Patent S1
US 1,011,669 · App. 29/866,081 · Granted Jan 16, 2024

Polishing pad

Inventor: Shengwang Fan (Xingtai, CN)
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Quick Facts
Patent No.
US 1,011,669
App. No.
29/866,081
Granted
Jan 16, 2024
Kind
S1
Claims (1)

The ornamental design for a polishing pad, as shown and described.