Superhydrophobic and self-cleaning substrate and a method of coating
View Patent ↗A superhydrophobic and self-cleaning surface including a substrate and a superhydrophobic layer. The superhydrophobic layer having a reacted form of octadecyltrichlorosilane. The octadecyltrichlorosilane is disposed on and crosslinked to a surface of the substrate via surface hydroxyl groups. The surface exhibits a rms roughness of 40 nm to 60 nm, a water contact angle of 155° to 180°, and a contact angle hysteresis of less than 15°. A method of preparing the substrate with a superhydrophobic and self-cleaning surface including treating a substrate with a plasma treatment, contacting the substrate with water or an alcohol to form an hydroxylated substrate, contacting the hydroxylated substrate with a solution of octadecyltrichlorosilane in an alkane solvent at a concentration in the range of 0.05 M to 0.3 M, and drying the solution on to the substrate under ambient air to form the superhydrophobic and self-cleaning surface on the substrate.
1. A substrate with a superhydrophobic and self-cleaning surface, comprising:
a substrate comprising a surface modified with hydroxyl groups; and
a superhydrophobic layer, which is a 3-dimensional polysiloxane network of cylindrical fibers having a diameter of 45 nm to 100 nm with pores in between the cylindrical fibers, formed from vertical and horizontal polymerization of octadecyltrichlorosilane;
wherein the superhydrophobic layer is disposed on and crosslinked to the surface of the substrate via the hydroxyl groups; and
wherein the substrate with the superhydrophobic and self-cleaning surface has a root mean square roughness of 40 nm to 60 nm, a water contact angle of 155° to 180°, and a contact angle hysteresis of less than 15°.
2. The substrate with a superhydrophobic and self-cleaning surface of claim 1 , wherein the substrate is a glass, a hard plastic, a non-woven fabric, a cotton fabric, a non-woven synthetic polymer fabric, or a combination thereof.
3. The substrate with a superhydrophobic surface and self-cleaning surface of claim 1 , wherein a height of the cylindrical fibers from peak to valley is in the range of 0.9 nanometers to 500 nanometers.
4. The substrate with a superhydrophobic and self-cleaning surface of claim 1 , wherein the pores have a pore size in the range of 140 nm to 260 nm.
5. The substrate with a superhydrophobic and self-cleaning surface of claim 1 , which is resistant to particles having a size of at least 0.8 micron.
6. A method of preparing the substrate with a superhydrophobic and self-cleaning surface of claim 1 , the method comprising:
treating the substrate with a plasma treatment under a reduced pressure of 0.5 atm to vacuum;
removing the substrate from the reduced pressure and contacting the substrate with water, an alcohol, or both to form a hydroxylated substrate;
contacting the hydroxylated substrate with a solution comprising octadecyltrichlorosilane and an alkane solvent, wherein a concentration of the octadecyltrichlorosilane in the alkane solvent is in the range of 0.05 M to 0.3 M; and
drying the solution on a surface of the substrate under air to form the substrate with the superhydrophobic and self-cleaning surface.
7. The method of claim 6 , wherein the plasma treatment is at least one selected from the group consisting of an oxygen plasma, an argon plasma treatment, and a nitrogen plasma treatment.
8. The method of claim 6 , wherein the alkane is hexane.
9. The method of claim 6 , wherein the dying is under a heated air stream.
10. The method of claim 6 , wherein the treating is for 1 minute to 5 minutes under a vacuum.
11. The method of claim 6 , further comprising repeating the contacting and the drying.
12. The method of claim 6 , wherein the substrate is a glass, a hard plastic, a non-woven fabric, a cotton fabric, a non-woven synthetic polymer fabric, or a combination thereof.