Compact two-sided reticle inspection system
An apparatus and method is provided to efficiently and more precisely inspect reticles for contamination. The inspection system is used to image the reticle back-side and pellicle-side separately by transferring the reticle while maintaining desired demagnification. An inspection system is disclosed that includes a reticle support to support the reticle at a first position and an illumination source to illuminate a first surface of the reticle at the first position. The inspection system further includes a first sensor to receive light from the illuminated first surface of the reticle when the reticle is at the first position and a second sensor to receive light from an illuminated second surface of the reticle when the reticle is at a second position.
1. An inspection system, comprising:
a reticle support configured to support a reticle at a first position;
an illumination source configured to illuminate a first surface of the reticle when the reticle is at the first position;
a first sensor configured to receive light from the illuminated first surface of the reticle when the reticle is at the first position;
the reticle support further configured to support the reticle at a second position separate from the first position;
the illumination source further configured to illuminate a second surface of the reticle when the reticle is at the second position separate from the first position;
a second sensor configured to receive light from the illuminated second surface of the reticle when the reticle is at the second position; and
a processor configured to control transfer of the reticle support between the first and second positions.
2. The inspection system of claim 1 , wherein the processor is further configured to determine contamination of the first and second surfaces of the reticle.
3. The inspection system of claim 1 , wherein the first and second sensors include inspection cameras configured to image the first and second surfaces of the reticle.
4. The inspection system of claim 1 , wherein the first surface of the reticle includes a glass back-side surface of the reticle and the second surface of the reticle includes a pellicle attached to a front-side of the reticle.
5. The inspection system of claim 1 , wherein the illumination source, the first sensor, and the second sensor are integrated into a lithography system for enabling the inspection system to inspect the reticle.
6. A method, comprising:
positioning a reticle at a first position;
illuminating a first surface of the reticle when the reticle is at the first position;
receiving light from the illuminated first surface of the reticle when the reticle is at the first position;
transferring the reticle from the first position to a second position separate from the first position;
illuminating a second surface of the reticle when the reticle is at the second position separate from the first position; and
receiving light from the illuminated second surface of the reticle when the reticle is at the second position.
7. The method of claim 6 , wherein receiving light from the illuminated first and second surfaces includes imaging the first and second surfaces of the reticle.
8. The method of claim 6 , further comprising:
determining contamination of the first and second surfaces of the reticle.
9. The method of claim 6 , wherein the first surface of the reticle includes a glass back-side surface of the reticle and the second surface of the reticle includes a pellicle attached to a front-side of the reticle.
10. A lithography system, comprising:
an inspection system including:
a reticle support configured to support a reticle at a first position,
an illumination source configured to illuminate a first surface of the reticle when the reticle is at the first position,
a first sensor configured to receive light from the illuminated first surface of the reticle when the reticle is at the first position,
the reticle support further configured to support the reticle at a second position separate from the first position;
the illumination source further configured to illuminate a second surface of the reticle when the reticle is at the second position separate from the first position; and
a second sensor configured to receive light from the illuminated second surface of the reticle when the reticle is at the second position,
a processor configured to control transfer of the reticle support between the first and second positions;
a second illumination source configured to provide a light beam; and
a projection system configured to project a patterned light beam from the reticle onto a substrate.
11. The lithography system of claim 10 , wherein the processor is further configured to determine contamination of the first and second surfaces of the reticle.
12. The lithography system of claim 10 , wherein the first and second sensors include inspection cameras configured to image the first and second surfaces of the reticle.
13. The lithography system of claim 10 , wherein the first surface of the reticle includes a glass back-side surface of the reticle and the second surface of the reticle includes a pellicle attached to a front-side of the reticle.