IP Library › Granted Patent US 10,170,696
Granted Patent B1
US 10,170,696 · App. 15/795,096 · Granted Jan 1, 2019

MnN and Heusler layers in magnetic tunnel junctions

Inventors: Jaewoo Jeong (San Jose, CA); Stuart S. P. Parkin (San Jose, CA); Mahesh G. Samant (San Jose, CA)
Assignees: International Business Machines Corporation; Samsung Electronics Co., Ltd.
H01L43/10G11C11/1673G11C11/1675H01F1/147H01F10/30H01L27/222H01L43/08
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Quick Facts
Patent No.
US 10,170,696
App. No.
15/795,096
Granted
Jan 1, 2019
Kind
B1
Abstract

Materials are disclosed that are used as seed layers in the formation of MRAM elements. In particular, a MnN layer oriented in the (001) direction is grown over a substrate. A magnetic layer overlying and in contact with the MnN layer forms part of a magnetic tunnel junction, in which the magnetic layer includes a Heusler compound that includes Mn. The magnetic tunnel junction includes the magnetic layer, a tunnel barrier overlying the magnetic layer, and a first (magnetic) electrode overlying the tunnel barrier. A second electrode is in contact with the MnN layer.

Claims (30)

1. A stacked structure, comprising:

a substrate;

a MnN layer overlying the substrate, wherein the MnN layer is predominantly oriented in the (001) direction; and

a magnetic layer overlying and in contact with the MnN layer, the magnetic layer forming part of a magnetic tunnel junction, wherein the magnetic layer includes a Heusler compound that includes Mn, and wherein the magnetic layer is ferromagnetic or ferrimagnetic.

2. The structure of claim 1 , wherein the Heusler compound is tetragonal.

3. The structure of claim 1 , wherein the magnetic layer and the magnetic tunnel junction have respective crystalline structures that are coincident with each other.

4. The structure of claim 1 , wherein the MnN layer and the magnetic layer have respective crystalline structures that are coincident with each other.

5. The structure of claim 1 , wherein the magnetic tunnel junction includes:

the magnetic layer;

a tunnel barrier overlying the magnetic layer; and

a first electrode overlying the tunnel barrier, wherein the first electrode is made of magnetic material.

6. The structure of claim 5 , comprising;

a capping layer overlying and in contact with the magnetic tunnel junction.

7. The structure of claim 6 , wherein the tunnel barrier is MgO.

8. The structure of claim 6 , wherein the tunnel barrier is Mg 1-x Al 2-x O 4 , wherein −0.5<x<0.5.

9. The structure of claim 6 , wherein the tunnel barrier is AlN.

10. The structure of claim 6 , comprising:

a second electrode in contact with the MnN layer.

11. An array, comprising:

at least 100 stacked structures given by claim 10 , said structures being interconnected to form a memory device.

12. A method, comprising:

writing data into the first electrodes of the array of claim 11 .

13. The method of claim 12 , comprising:

reading data stored in the first electrodes of the array.

14. A stacked structure, comprising:

a substrate;

a MnN layer overlying the substrate, wherein the MnN layer is predominantly oriented in the (001) direction; and

a magnetic layer overlying and in contact with the MnN layer, wherein the magnetic layer includes a Heusler compound that includes Mn, and wherein the magnetic layer is ferromagnetic or ferrimagnetic.

15. The stacked structure of claim 14 , wherein the magnetic layer includes discrete magnetic domains.

16. The stacked structure of claim 15 , wherein the discrete magnetic domains have respective magnetization directions that correspond to data that have been stored in the stacked structure.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 18, 2017
From: JEONG, JAEWOO
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 044426/0078 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 20, 2017
From: PARKIN, STUART S.P.; SAMANT, MAHESH G.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 044182/0269 →
Cited By (3)
US 12,274,179 US 12,317,508 US 12,581,868