IP Library › Granted Patent US 1,028,173
Granted Patent S1
US 1,028,173 · App. 29/928,493 · Granted May 21, 2024

High pressure cleaning apparatus

Inventor: Zhongyuan Chu (Qiqihar, CN)
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 1,028,173
App. No.
29/928,493
Granted
May 21, 2024
Kind
S1
Claims (1)

The ornamental design for a high pressure cleaning apparatus, as shown and described.