IP Library › Granted Patent US 1,028,222
Granted Patent S1
US 1,028,222 · App. 29/842,213 · Granted May 21, 2024

Mask

Inventor: Jae Won Shin (Seoul, KR)
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Quick Facts
Patent No.
US 1,028,222
App. No.
29/842,213
Granted
May 21, 2024
Kind
S1
Claims (1)

I claim the ornamental design for a mask, as shown and described.

Priority Claims (1)
KR 30-2022-0007596 · Feb 24, 2022 · national