IP Library › Granted Patent US 1,031,174
Granted Patent S1
US 1,031,174 · App. 29/847,384 · Granted Jun 11, 2024

Mask

Inventor: Jae Won Shin (Seoul, KR)
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Quick Facts
Patent No.
US 1,031,174
App. No.
29/847,384
Granted
Jun 11, 2024
Kind
S1
Claims (1)

The ornamental design for a mask, as shown and described.

Priority Claims (1)
KR 30-2022-0024461 · Jun 20, 2022 · national