IP Library Granted Patent US 10,312,384
Granted Patent B2
US 10,312,384 · App. 15/351,455 · Granted Jun 4, 2019

Solar cell

Inventors: Chao-Cheng Lin (Taichung, TW); Chien-Kai Peng (Taipei, TW); Chen-Cheng Lin (Nantou County, TW); Chen-Hsun Du (Taipei, TW); Chorng-Jye Huang (Hsinchu, TW); Chun-Ming Yeh (Taipei, TW)
Assignee: Industrial Technology Research Institute
H01L31/022433H01L31/028H01L31/022425H01L31/022466H01L31/0747H01L31/1804Y02E10/547Y02P70/521
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,312,384
App. No.
15/351,455
Granted
Jun 4, 2019
Kind
B2
Abstract

A solar cell is provided. The solar cell includes a Si substrate having a first surface and a second surface opposite to each other, an emitter, a first electrode, a doped region, a passivation layer, a doped polysilicon layer, a semiconductor layer, and a second electrode. The emitter is disposed on the first surface. The first electrode is disposed on the emitter. The doped region is disposed in the second surface. The passivation layer is disposed on the second surface. The doped polysilicon layer is disposed on the passivation layer, wherein a plurality of holes penetrates the doped polysilicon layer and the passivation layer and exposes a portion of the second surface. The semiconductor layer is disposed on the doped polysilicon layer and in the holes. The band gap of the semiconductor layer is greater than that of the Si substrate. The second electrode is disposed on the semiconductor layer.

Claims (13)

1. A solar cell, comprising:

a silicon substrate having a first surface and a second surface opposite to each other;

an emitter disposed on the first surface;

a first electrode disposed on the emitter;

a doped region disposed in the second surface;

a passivation layer disposed on the second surface;

a doped polysilicon layer disposed on the passivation layer, wherein a plurality of holes penetrates the doped polysilicon layer and the passivation layer and exposes a portion of the second surface;

a semiconductor layer disposed on the doped polysilicon layer and in the holes, wherein a band gap of the semiconductor layer is greater than a band gap of the silicon substrate, and a material of the semiconductor layer is doped silicon carbide; and

a second electrode disposed on the semiconductor layer.

2. The solar cell of claim 1 , wherein a thickness of the semiconductor layer is between 5 nm and 50 nm.

3. The solar cell of claim 1 , further comprising a transparent conductive layer disposed between the first electrode and the emitter.

4. The solar cell of claim 1 , further comprising a transparent conductive layer disposed between the second electrode and the semiconductor layer.

5. The solar cell of claim 1 , wherein a pore size of the holes does not exceed 200 μm.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 17, 2016
From: LIN, CHAO-CHENG; PENG, CHIEN-KAI; LIN, CHEN-CHENG; DU, CHEN-HSUN; HUANG, CHORNG-JYE; YEH, CHUN-MING
To: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Reel/Frame 040364/0376 →
Priority Claims (1)
TW 105134485 A · Oct 26, 2016 · national
Continuity (1)
Related Publication 20180114871A1 · Apr 26, 2018