IP Library › Granted Patent US 1,035,161
Granted Patent S1
US 1,035,161 · App. 29/851,540 · Granted Jul 9, 2024

Mask

Inventor: Jae Won Shin (Seoul, KR)
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Quick Facts
Patent No.
US 1,035,161
App. No.
29/851,540
Granted
Jul 9, 2024
Kind
S1
Claims (1)

The ornamental design for a mask, as shown and described.

Priority Claims (1)
KR 30-2022-0028985 · Jul 18, 2022 · national
Cited By (1)
US 12,359,527