IP Library › Granted Patent US 1,035,598
Granted Patent S1
US 1,035,598 · App. 29/749,079 · Granted Jul 16, 2024

Gas distribution plate for a semiconductor processing chamber

Inventors: Mahesh Ramakrishna (Bengaluru, IN); Yury Shustrov (St. Petersburg, RU)
Assignee: Applied Materials, Inc.
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Quick Facts
Patent No.
US 1,035,598
App. No.
29/749,079
Granted
Jul 16, 2024
Kind
S1
Claims (1)

The ornamental design for a gas distribution plate for a semiconductor processing chamber, as shown and described.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 31, 2020
From: RAMAKRISHNA, MAHESH; SHUSTROV, YURY
To: APPLIED MATERIALS, INC.
Reel/Frame 054784/0836 →