IP Library Granted Patent US 10,357,580
Granted Patent B2
US 10,357,580 · App. 15/505,960 · Granted Jul 23, 2019

Electrode arrangement for forming a dielectric barrier plasma discharge

Inventors: Leonhard Trutwig (Duderstadt, DE); Mirko Hahnl (Berlingerode, DE); Karl-Otto Storck (Duderstadt, DE); Matthias Kopp (Gieboldehausen, DE); Annika Schaefer (Goettingen, DE); Dirk Wandke (Heilbad Heiligenstadt, DE)
Assignee: CINOGY GmbH
A61L2/0011A61B18/042A61L2/14H01J37/32348H01J37/32541H01J37/32568H05H1/2406A61B2018/00452A61B2018/147A61L2202/16H05H2001/2418H05H2277/10
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Quick Facts
Patent No.
US 10,357,580
App. No.
15/505,960
Granted
Jul 23, 2019
Kind
B2
Abstract

An electrode arrangement for forming a dielectric barrier plasma discharge between a flat surface ( 4 ) of the electrode arrangement and a surface to be treated which functions as a counter surface and on which a fluid can collect, comprising a flat electrode ( 14 ) which can be connected to a high-voltage source by means of a connector and which is completely embedded in a flat dielectric ( 2 ), except for the connector for the high-voltage source, wherein the dielectric ( 2 ) forms an upper surface ( 1 ) and a lower surface ( 4 ) which appears as a flat surface to the surface to be treated, enables the drainage or supply of a fluid by means of a simple design. The flat electrode ( 14 ) has through openings ( 15 ) distributed across the surface thereof, and the dielectric ( 2 ) is provided with through openings ( 3 ) which extend from the lower surface ( 4 ) to the upper surface ( 1 ) and which align with the through openings ( 15 ) of the electrode ( 14 ) and which have smaller dimensions than the through openings ( 15 ) of the electrode ( 14 ), so that the dielectric ( 2 ) is also completely covered in the region of the through openings ( 15 ) of the electrode ( 14 ).

Claims (26)

1. An electrode arrangement, comprising:

a flat electrode connectable to a high voltage source by a connector; and

a flat dielectric, wherein the flat electrode except for the connector for the high voltage source is completely embedded in the flat dielectric, wherein the flat dielectric has a top surface and a bottom surface, wherein the bottom surface is a flat surface which faces a surface to be treated,

wherein the flat electrode has through-holes distributed over a plane formed by the flat electrode, and the flat dielectric has through-holes which extend from the bottom surface to the top surface and align with the through-holes of the flat electrode,

wherein the through-holes of the flat dielectric have smaller dimensions than the through-holes of the flat electrode but where the smaller dimensions are sufficient to allow fluid to pass therethrough from the bottom surface to the top surface of the flat dielectric, and

wherein the flat dielectric completely covers the flat electrode in each of the through-holes in the flat electrode,

wherein the bottom surface of the flat dielectric includes one or more features projecting therefrom which define a height of an open space when the electrode arrangement rests on the surface to be treated,

wherein the electrode arrangement is configured for forming a dielectric barrier plasma discharge in the open space between the bottom surface of the electrode arrangement and the surface to be treated with the surface to be treated functioning as a counter electrode, and with the fluid that collects on the surface to be treated being permitted to pass through the through-holes of the flat dielectric without contacting the through-holes of the flat electrode.

2. The electrode arrangement as claimed in claim 1 , wherein the one or more features are circular protuberances.

3. The electrode arrangement as claimed in claim 2 , wherein the through-holes of the flat dielectric are located between the protuberances.

4. The electrode arrangement as claimed in claim 1 wherein the flat dielectric consists of a castable plastic.

5. A combination of a contact arrangement and an electrode arrangement,

wherein the electrode arrangement comprises

a flat electrode connectable to a high voltage source by a connector; and

a flat dielectric, wherein the flat electrode except for the connector for the high voltage source is completely embedded in the flat dielectric, wherein the flat dielectric has a top surface and a bottom surface, wherein the bottom surface is a flat surface which faces a surface to be treated,

wherein the flat electrode has through-holes distributed over a plane formed by the flat electrode, and the flat dielectric has through-holes which extend from the bottom surface to the top surface and align with the through-holes of the flat electrode,

wherein the through-holes of the flat dielectric have smaller dimensions than the through-holes of the flat electrode but where the smaller dimensions are sufficient to allow fluid to pass therethrough from the bottom surface to the top surface of the flat dielectric, and

wherein the flat dielectric completely covers the flat electrode in each of the through-holes in the flat electrode, and

wherein the bottom surface of the flat dielectric includes one or more features projecting therefrom which define a height of an open space when the electrode arrangement rests on the surface to be treated,

wherein the electrode arrangement is configured for forming a dielectric barrier plasma discharge in the open space between the bottom surface of the electrode arrangement and the surface to be treated with the surface to be treated functioning as a counter electrode, and with the fluid that collects on the surface to be treated being permitted to pass through the through-holes of the flat dielectric without contacting the through-holes of the flat electrode, and

wherein the electrode arrangement is connectable to the contact arrangement with the connector of the flat electrode which is free from the flat dielectric being configured to be connected to the contact arrangement which engages over the connector in a clamping and insulating manner, wherein

the contact arrangement has a clamping state and an initial state, wherein a high voltage contact presses with a preload against the connector of the flat electrode in the clamping state and, in an initial state, the high voltage contact is covered by an insulating piece which is movable with a transition from the initial state into the clamping state.

6. The combination as claimed in claim 5 , wherein the contact arrangement comprises a housing having a slot which is open on one side, and a clamping arrangement for pressing the high voltage contact against the connector of the electrode, wherein the clamping arrangement is mounted in the housing.

7. The combination as claimed in claim 5 wherein the high voltage contact is a cylindrical contact which engages into a corresponding recess of the flat dielectric in the clamping state, and the recess extends up to a flat connector piece of the flat electrode.

8. The electrode arrangement as claimed in claim 1 wherein the bottom side of the flat dielectric is coated with a wound dressing.

9. The electrode arrangement as claimed in claim 8 , wherein the wound dressing consists of a layer made from a solid, open-pore matrix made from a therapeutic or curative material.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 23, 2017
From: TRUTWIG, LEONHARD; HAHNL, MIRKO; STORCK, KARL-OTTO; KOPP, MATTHIAS; SCHAEFER, ANNIKA; WANDKE, DIRK
To: CINOGY GMBH
Reel/Frame 041353/0685 →
Priority Claims (1)
DE 10 2014 013 716 · Sep 11, 2014 · national
Continuity (1)
Related Publication 20180221517A1 · Aug 9, 2018
Cited By (2)
US 12,418,974 US 12,496,456