UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby

1. A UV-curable ink composition for forming a bezel pattern comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, and a surfactant,

wherein a content ratio of the epoxy compound to the oxetane compound is 1:3.45 to 1:6,

wherein the oxetane compound comprises an oxetane compound having one oxetane ring and an oxetane compound having two oxetane rings,

wherein a content ratio of the oxetane compound having one oxetane ring to the oxetane compound having two oxetane rings is 1:5.9 to 1:16, and

wherein the UV-curable ink composition has a taper angle of 0° to 10° after being cured.

2. The UV-curable ink composition of claim 1 , further comprising one or more selected from the group consisting of an adhesion promoter, a diluent, and a photosensitizer.

3. The UV-curable composition of claim 2 , wherein a content of the diluent is 0 to 30 wt % based on the total weight of the UV-curable ink composition.

4. The UV-curable composition of claim 2 , wherein the photosensitizer is contained in an amount of 1 to 200 parts by weight based on 100 parts by weight of the photopolymerization initiator.

5. The UV-curable composition of claim 2 , wherein the adhesion promoter is a epoxy silane-based compound.

6. The UV-curable composition of claim 2 , wherein the adhesion promoter is contained in an amount of 0.1 to 15 wt % based on the total weight of the UV-curable ink composition.

7. The UV-curable composition of claim 1 , wherein a content of the epoxy compound is 5 to 60 wt % with respect to the total weight of the UV-curable ink composition.

8. The UV-curable composition of claim 1 , wherein a content of the oxetane compound is 15 to 80 wt % with respect to the total weight of the UV-curable ink composition.

9. The UV-curable composition of claim 1 , wherein the photopolymerization initiator is an iodonium salt or a sulfonium salt.

10. The UV-curable composition of claim 1 , wherein a content of the photopolymerization initiator is 1 to 15 wt % based on the total weight of the UV-curable ink composition.

11. The UV-curable composition of claim 1 , wherein a content of the colorant is 1 to 15 wt % based on the total weight of the UV-curable ink composition.

12. The UV-curable composition of claim 1 , wherein the surfactant is a silicone-based, fluorine-based or acrylic surfactant.

13. The UV-curable composition of claim 1 , wherein a content of the surfactant is 0.1 to 5.0 wt % based on the total weight of the UV-curable ink composition.

14. The UV-curable composition of claim 1 , wherein a dose for curing the UV-curable ink composition is 1 to 10,000 mJ/cm 2 .

15. The UV-curable composition of claim 1 , wherein the UV-curable ink composition has a viscosity of 1 cp to 50 cp at 25° C.

16. The UV-curable composition of claim 15 , wherein the UV-curable ink composition has a viscosity of 3 cp to 45 cp at 25° C.

17. The UV-curable composition of claim 1 , which the ultraviolet-curable ink composition is able to be cured by absorbing radiation in the wavelength range of 250 nm to 450 nm.

18. The UV-curable composition of claim 17 , which the ultraviolet-curable ink composition is able to be cured by absorbing radiation in the wavelength range of 360 nm to 410 nm.

19. A method for producing a bezel pattern for a display substrate, comprising:

a) forming a bezel pattern on a substrate by using the UV-curable ink composition of claim 1 ; and

b) curing the bezel pattern.

20. The method of claim 19 , further comprising cleaning and drying the substrate prior to a) the forming of the bezel pattern.

21. The method of claim 20 , wherein the cleaning and drying of the substrate is carried out by one or more treatments selected from the group consisting of a wet surface treatment, a UV ozone treatment, and a normal pressure plasma treatment.

22. The method of claim 19 , wherein the method of forming the bezel pattern on the substrate in Step a) is a method selected from an inkjet printing, a gravure coating, and a reverse offset coating.

23. The method of claim 19 , wherein Step a) is carried out at a process temperature of 10° C. to 100° C.

24. The method of claim 23 , wherein Step a) is carried out at a process temperature of 20° C. to 70° C.

25. The method of claim 19 , wherein the bezel pattern in Step b) is cured by absorbing radiation in the wavelength range of 250 nm to 450.

26. The method of claim 25 , wherein the bezel pattern in Step b) is cured by absorbing radiation in the wavelength range of 360 nm to 410.

27. The method of claim 19 , wherein the bezel pattern has a thickness of 0.1 μm to 20 μm.

28. The method of claim 27 , wherein the bezel pattern has a thickness of 0.5 μm to 5 μm.

29. The method of claim 19 , wherein the bezel pattern has a taper angle of 0° to 30°.

30. The method of claim 29 , wherein the bezel pattern has a taper angle of 0° to 10°.

31. The method of claim 19 , wherein the bezel pattern has an OD value of 0.05 to 2.5 per a film thickness of 1.0 μm.

32. A bezel pattern for a display substrate, which is formed on a substrate by curing the UV-curable ink composition of claim 1 .

33. The bezel pattern of claim 32 , wherein the bezel pattern has a thickness of 0.1 μm to 20 μm.

34. The bezel pattern of claim 33 , wherein the bezel pattern has a thickness of 0.5 μm to 5 μm.

35. The bezel pattern of claim 32 , wherein the bezel pattern has a taper angle of 0° to 30°.

36. The bezel pattern of claim 35 , wherein the bezel pattern has a taper angle of 0° to 10°.

37. The bezel pattern of claim 32 , wherein the bezel pattern has an OD value of 0.05 to 2.5 per a film thickness of 1.0 μm.