Pixel structure and method for the fabrication thereof
View Patent ↗The present application discloses a pixel structure and method for the fabrication thereof including: providing a substrate; forming a black photoresist layer having a receiving cavity and an isolation region on the substrate; coating a polyelectrolyte solution on the surface of the black photoresist layer except the isolation region, and air-dried to form a polyelectrolyte layer; coating a metal nanoparticle solution on the surface of the polyelectrolyte layer, and air-dried to form a metal particle layer; and aligning and transferring a micro light emitting diodes to the black photoresist layer. In the above-described manner, the present disclosure can improve the light utilization efficiency of the micro light emitting diode.
1. A method for fabricating a pixel structure for improving the utilization ratio of micro light emitting diodes, comprising:
providing a substrate;
forming a black photoresist layer having a receiving cavity and an isolation region on the substrate;
coating a polyelectrolyte solution on the surface of the black photoresist layer except the isolation region, and air-drying the polyelectrolyte solution to form a polyelectrolyte layer;
coating a metal nanoparticle solution on the surface of the polyelectrolyte layer, and air-drying the metal nanoparticle solution to form a metal nanoparticle layer; and
aligning and transferring a micro light emitting diodes to the isolation region of the black photoresist layer.
2. The method for fabricating the pixel structure according to claim 1 , wherein the black photoresist layer is formed by adapting photolithography process in one step.
3. The method for fabricating the pixel structure according to claim 1 , wherein the black photoresist layer is formed by adapting photolithography process in two step.
4. The method for fabricating the pixel structure according to claim 1 , wherein the polyelectrolyte layer and the metal nanoparticle layer are electrically opposite to each other.
5. The method for fabricating the pixel structure according to claim 1 , wherein the metal nanoparticle comprising at least one of Au, Ag, Cu, Ni, Co, Pt and/or an alloy formed by at least two of Au, Ag, Cu, Ni, Co and Pt.
6. The method for fabricating the pixel structure according to claim 1 , wherein the polyelectrolyte layer comprising at least one of Poly Dially Ammonium Chloride, Sodium Polyacrylate, Poly Dimethyl Dially Ammonium Chloride, and Acrylic AcidVinylpyridine Copolymer.