IP Library Granted Patent US 1,038,901
Granted Patent S1
US 1,038,901 · App. 29/822,866 · Granted Aug 13, 2024

Collimator for a physical vapor deposition chamber

Inventors: Fuhong Zhang (San Jose, CA); Martin Lee Riker (Round Rock, TX); Suhas Bangalore Umesh (Sunnyvale, CA); Madan Kumar Shimoga Mylarappa (Bengaluru, IN)
Assignee: APPLIED MATERIALS, INC.
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Quick Facts
Patent No.
US 1,038,901
App. No.
29/822,866
Granted
Aug 13, 2024
Kind
S1
Claims (1)

The ornamental design for a collimator for a physical vapor deposition chamber, as shown and described.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 6, 2022
From: SHIMOGA MYLARAPPA, MADAN KUMAR
To: APPLIED MATERIALS, INC.
Reel/Frame 060996/0585 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 24, 2022
From: ZHANG, FUHONG; RIKER, MARTIN LEE; BANGALORE UMESH, SUHAS
To: APPLIED MATERIALS, INC.
Reel/Frame 058737/0719 →