IP Library Granted Patent US 10,400,347
Granted Patent B2
US 10,400,347 · App. 15/763,684 · Granted Sep 3, 2019

Conductive member, and production method therefor

Inventors: Yosuke Nishikawa (Shizuoka, JP); Sayuri Shimizu (Shizuoka, JP); Shinichiro Sumi (Shizuoka, JP)
Assignee: NIPPON LIGHT METAL COMPANY, LTD.
C25D3/12C25D5/16C25D7/00H01R4/58H01R13/03H01R43/16H01R4/70
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Quick Facts
Patent No.
US 10,400,347
App. No.
15/763,684
Granted
Sep 3, 2019
Kind
B2
Abstract

To provide a conductive member capable of suppressing an increase in contact resistance, and a production method therefor. To solve the problem by providing a conductive member having a Ni plating layer 3 on the surface of contact parts 2 provided on a substrate 1 , an arithmetic average roughness Sa of the surface of the Ni plating layer 3 being 20 nm or more. In the Ni plating layer 3 , the full width half maximum of a peak at the position of a Ni (200) plane in an x-ray diffraction diagram is preferably 0.6 or less, and an indentation hardness H IT of the Ni plating layer 3 is preferably 5000 n/mm 2 or less.

Claims (13)

1. A conductive member having a Ni plating layer on the surface of contact parts provided on a substrate of the conductive member, an arithmetic average roughness Sa of the surface of the Ni plating layer being 20 nm or more, wherein in the Ni plating layer, the full width half maximum of a peak at the position of a Ni (200) plane in an x-ray diffraction diagram is 0.6° or less.

2. The conductive member according to claim 1 , wherein an indentation hardness H IT of the Ni plating layer is 5000 N/mm 2 or less.

3. The conductive member according to claim 1 , wherein the content of sulfur in the Ni plating layer is under 0.1 mass%.

4. The conductive member according to claim 1 , wherein a resin layer is formed on surfaces other than the contact parts.

5. The conductive member according to claim 1 , wherein the substrate comprises aluminum or an aluminum alloy.

6. A production method for the conductive member according to claim 1 , comprising:

a step for preparing the substrate, and

a plating step for bringing the contact parts provided on the substrate into contact with a Ni plating solution,

wherein the Ni plating solution does not contain a brightener that includes sulfur.

7. The production method according to claim 6 , wherein electroplating is performed using a sulfamic acid bath with a pH of 3.5-4.8 in the plating step.

8. The production method according to claim 6 , wherein the step for preparing the substrate is a step for drawing out a substrate wound in a coil shape, and

the production method further comprises, following the plating step, a step for winding the plated substrate in a coil shape, and a step for cutting and shaping the substrate.

9. The production method according to claim 6 , wherein the production method comprises, following the plating step, a step for providing a resin layer on portions other than the contact parts.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 28, 2019
From: NISHIKAWA, YOSUKE; SHIMIZU, SAYURI; SUMI, SHINICHIRO
To: NIPPON LIGHT METAL COMPANY, LTD.
Reel/Frame 049292/0551 →
Priority Claims (1)
JP 2015-189948 · Sep 28, 2015 · national
Continuity (1)
Related Publication 20180298510A1 · Oct 18, 2018
Cited By (1)
US 12,410,534