IP Library Granted Patent US 10,414,682
Granted Patent B2
US 10,414,682 · App. 15/307,258 · Granted Sep 17, 2019

Process and device for melting and fining glass

Inventors: Olivier Mario (Paris, FR); Arnaud Le Verge (Paris, FR); Jean-Marie Combes (Eaubonne, FR)
Assignee: SAINT-GOBAIN GLASS FRANCE
C03B5/04C03B5/182C03B5/23C03B18/02Y02P40/57
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Quick Facts
Patent No.
US 10,414,682
App. No.
15/307,258
Granted
Sep 17, 2019
Kind
B2
Abstract

The invention relates to a process and a device for manufacturing molten glass comprising from upstream to downstream a furnace for melting and fining glass equipped with cross-fired overhead burners, then a conditioning basin supplied with glass by the furnace, the dimensions of this manufacturing device being such that K is higher than 3.5, the factor K being determined from the dimensions of the device. The invention makes it possible to dimension a device for melting glass so that it is smaller and consumes less energy while producing high quality glass.

Claims (238)

1. A process for manufacturing molten glass in a device comprising, from upstream to downstream, a furnace for melting and fining glass equipped with cross-fired overhead burners, and then a conditioning basin comprising one or more compartments, the process comprising melting glass in the furnace,

wherein:

the furnace comprises a melting zone and a fining zone;

the bottom of the fining zone and the bottom of the conditioning basin are deep enough that a single downstream recirculation loop passes through the fining zone and through all the compartments of the conditioning basin;

the conditioning basin is supplied with glass by the furnace; and

the dimensions of the device are such that K is higher than 3.5, where:

K

=

K

a

+

i

K

S

i

,

in which:

K

a

=

0.000727

×

S

f

×

x

0

x

1

[

P

(

x

)

]

2

[

σ

(

x

)

]

3

dx

;

S f represents the area under flame in the furnace;

x 0 is the abscissa in the general flow direction of the glass of the end of the area under flame in the furnace;

x 1 is the abscissa in the general flow direction of the glass of the end of the conditioning basin;

σ(x) represents the area of the cross section of flow of the glass of the device at the abscissa x;

P(x) represents the perimeter of the cross section of flow of the glass of the device at the abscissa x; and

Σ i K Si represents the sum of the K Si due to a singular element in the device downstream of the area under flame in the furnace, a singular element producing, from upstream to downstream and over less than 2 m in the flow direction of the glass, a decrease in the cross section of flow of the glass of more than 10% then an increase in the cross section of flow of the glass of more than 10%, where

K

S

i

=

0.0012

×

(

exp

[

5.16

(

σ

i

-

σ

S

i

σ

i

)

2.55

]

-

1

)

(

S

f

σ

i

)

2

;

σ i representing the area of the cross section of flow of the glass just upstream of the singular element S i ; and

σ Si representing the area of the minimum cross section of flow produced by the singular element S i .

2. The process of claim 1 , wherein K>5.5.

3. The process of claim 2 , wherein K>7.5.

4. The process of claim 3 , wherein K is higher than 9.

5. The process of claim 1 , wherein a ratio of the area under flame in the furnace to the area of the conditioning basin is higher than 1.4.

6. The process of claim 5 , wherein the ratio of the area under flame in the furnace to the area of the conditioning basin is higher than 1.6.

7. The process of claim 6 , wherein the ratio of the area under flame in the furnace to the area of the conditioning basin is higher than 1.8.

8. The process of claim 1 , wherein the furnace is sufficiently deep that an upstream recirculation loop and the downstream recirculation loop form in the furnace.

9. The process of claim 1 , wherein the conditioning basin comprises, from upstream to downstream, a neck then a working end.

10. The process of claim 1 , wherein the furnace has a capacity of 500 to 1500 m 3 of glass.

11. The process of claim 1 , having a pull of 400 to 1300 tonnes of glass per day.

12. The process of claim 1 , wherein the cross-fired overhead burners use an oxidant comprising 10 to 30 vol % O 2 , and are equipped with regenerators and function pairwise in reversal mode.

13. The process of claim 1 , wherein the cross-fired overhead, burners use an oxidant containing 80 to 100 vol % O 2 .

14. The process of claim 1 , wherein in the conditioning basin in any vertical plane transverse to the longitudinal axis of the furnace, there are points in the glass having a longitudinal velocity component pointing from downstream to upstream.

15. The process of to claim 1 , wherein after the conditioning basin, the glass passes into a channel itself supplying a forming device, with no backflow occurring in the channel.

16. The process of claim 15 , wherein a length of the channel ranges from 0.3 to 10 m.

17. A process for manufacturing flat glass, the process comprising manufacturing a molten glass with the process of claim 1 , and then forming the molten glass into flat glass by floating the molten glass on a molten metal bath in a float chamber.

18. A device for manufacturing molten glass, the device comprising, from upstream to downstream, a furnace for melting and fining glass equipped with cross-tired overhead burners, and then a conditioning basin comprising one or more compartments,

wherein:

the furnace comprises a melting zone and a fining zone;

the bottom of the fining zone and the bottom of the conditioning basin are deep enough that a single downstream recirculation loop passes through the fining zone and through all the compartments of the conditioning basin;

the conditioning basin is supplied with glass by the furnace; and

the dimensions of the device are such that K is higher than 3.5, where:

K

=

K

a

+

i

K

S

i

,

in which:

K

=

0.000727

×

S

f

×

x

0

x

1

[

P

(

x

)

]

2

[

σ

(

x

)

]

3

dx

;

S f represents the area under flame in the furnace;

x 0 is the abscissa in the general flow direction of the glass of xe end of the area under flame in the furnace;

x 1 is the abscissa in the general flow direction of the glass of xe end of the conditioning basin;

σ(x) represents the area of the cross section of flow of the glass of the device at the abscissa x;

P(x) represents the perimeter of the cross section of flow of the glass of the device at the abscissa x; and

Σ i K Si represents the sum of the K Si due to a singular element in the device downstream of the area under flame in the furnace, a singular element producing, from upstream to downstream and over less than 2 m in the flow direction of the glass, a decrease in the cross section of flow of the glass of more than 10% then an increase in the cross section of flow of the glass of more than 10%, where

K

S

i

=

0.0012

×

(

exp

[

5.16

(

σ

i

-

σ

S

i

σ

i

)

2.55

]

-

1

)

(

S

f

σ

i

)

2

;

σ i representing the area of the cross section of flow of the glass just upstream of the singular element S i ; and σ Si representing the area of the minimum cross section of flow produced by the singular element S i .

19. The device of claim 18 , wherein K>5.5.

20. The device of claim 19 , wherein K>7.5.

21. The device of claim 20 , wherein K is higher than 9.

22. The device of claim 18 , wherein a ratio of the area under flame in the furnace to the area of the conditioning basin is higher than 1.4.

23. The device of claim 22 , wherein the ratio of the area under flame in the furnace to the area of the conditioning basin is higher than 1.6.

24. The device of claim 23 , wherein the ratio of the area under flame in the furnace to the area of the conditioning basin is higher than 1.8.

25. The device of claim 18 , wherein

a ratio of the area under flame in the furnace to the area of the conditioning basin is lower than 4.

26. The device of claim 18 , wherein the furnace is deep enough that an upstream recirculation loop and the downstream recirculation loop form in the furnace.

27. The device of claim 18 , wherein the conditioning basin comprises, from upstream to downstream, a neck then a working end.

28. The device of claim 18 , wherein the furnace has a capacity of 500 to 1500 m 3 of glass.

29. The device of claim 18 , having a pull of 400 to 1300 tonnes of glass per day.

30. The device of claim 18 , wherein the cross-fired burners use an oxidant comprising 10 to 30 vol % O 2 , and are equipped with regenerators and function pairwise in reversal mode.

31. The device of claim 18 , wherein in the conditioning basin in any vertical plane transverse to the longitudinal axis of the furnace, there are points in the glass having a longitudinal velocity component pointing from downstream to upstream.

32. The device of claim 18 , wherein after the conditioning basin, a glass being manufactured passes into a channel itself supplying a forming device, with no backflow occurring in the channel.

33. The device of claim 32 , wherein a the length of the channel ranges from 0.3 to 10 m.

34. A device for manufacturing flat glass, the device comprising the device of claim 18 , and a float chamber in which a molten glass is floated on a molten metal bath.

35. The device of claim 18 , further comprising, over its entire length, tank blocks containing the molten glass, wherein glass height is a distance between the upper level of the tank blocks decreased by a safety margin of between 30 and 130 mm and the level of the bottom.

36. The process of claim 3 , wherein K is higher than 10.5.

37. THE process of claim 1 , wherein:

K>5.5;

a ratio of the area under flame in the furnace to the area of the conditioning basin is higher than 1.4;

the furnace is sufficiently deep that an upstream recirculation loop and the downstream recirculation loop form in the furnace;

in the conditioning basin in any vertical plane transverse to the longitudinal axis of the furnace, there are points in the glass having a longitudinal velocity component pointing from downstream to upstream; and

after the conditioning basin, the glass passes into a channel itself supplying a forming device, with no backflow occurring in the channel.

38. The device of claim 20 , wherein K is higher than 10.5.

39. The device of claim 18 , wherein:

K>5.5;

a ratio of the area under flame in the furnace to the area of the conditioning basin is higher than 1.4;

the furnace is deep enough that an upstream recirculation loop and the downstream recirculation loop form in the furnace;

in the conditioning basin in any vertical plane transverse to the longitudinal axis of the furnace, there are points in the glass having a longitudinal velocity component pointing from downstream to upstream; and

after the conditioning basin, a glass being manufactured passes into a channel itself supplying a forming device, with no backflow occurring in the channel.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 14, 2017
From: MARIO, OLIVIER; LE VERGE, ARNAUD; COMBES, JEAN-MARIE
To: SAINT-GOBAIN GLASS FRANCE
Reel/Frame 041713/0699 →
Priority Claims (2)
FR 14 53902 · Apr 29, 2014 · national
FR 14 53903 · Apr 29, 2014 · national
Continuity (1)
Related Publication 20170050874A1 · Feb 23, 2017