IP Library Granted Patent US 10,566,413
Granted Patent B2
US 10,566,413 · App. 15/724,147 · Granted Feb 18, 2020

MIM capacitor containing negative capacitance material

Inventors: Ye Lu (San Diego, CA); Junjing Bao (San Diego, CA); Bin Yang (San Diego, CA)
Assignee: QUALCOMM Incorporated
H01L28/40H01L21/3212H01L21/7684H01L23/5222H01L27/0808H01L27/10852H01L27/10894H01L27/11502H01L28/56H01L29/66181H01L29/66409H01L29/94
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,566,413
App. No.
15/724,147
Granted
Feb 18, 2020
Kind
B2
Abstract

A capacitor may include a first conductive layer forming a first capacitor plate, a second conductive layer forming a second capacitor plate, and a first insulating material on the first conductive layer. The first insulating material may include a positive capacitance material. The capacitor may further include a second insulating material disposed over the first insulating material and between the first insulating material and the second conductive layer. The second insulating material may include a negative capacitance ferroelectric material.

Claims (25)

1. A capacitor comprising:

a first conductive layer forming a first capacitor plate;

a second conductive layer forming a second capacitor plate;

a first insulating material on the first conductive layer, the first insulating material comprising a positive capacitance material;

a second insulating material disposed directly on the first insulating material and between the first insulating material and the second conductive layer, the second insulating material comprising a negative capacitance ferroelectric material;

a third insulating material on the second insulating material, the third insulating material comprising the positive capacitance material; and

a fourth insulating material on the third insulating material, the fourth insulating material comprising the negative capacitance ferroelectric material.

2. The capacitor of claim 1 , wherein the positive capacitance material is a high-k dielectric material.

3. The capacitor of claim 1 , wherein an absolute value of a capacitance of the negative capacitance ferroelectric material is greater than a capacitance of the positive capacitance material.

4. The capacitor of claim 1 , wherein the negative capacitance ferroelectric material is lead zirconate titanate (PZT).

5. The capacitor of claim 1 , wherein the negative capacitance ferroelectric material is HfZrO 2 .

6. The capacitor of claim 1 , wherein the negative capacitance ferroelectric material is polarized AlInN.

7. The capacitor of claim 1 , integrated into a mobile phone, a set top box, a music player, a video player, an entertainment unit, a navigation device, a computer, a hand-held personal communication systems (PCS) unit, a portable data unit, and/or a fixed location data unit.

8. A metal oxide semiconductor (MOS) varactor comprising:

a source region of a first polarity;

a drain region of the first polarity;

a channel region of the first polarity between the source region and the drain region, the channel region including a gate;

a first insulating material on the gate, the first insulating material comprising a positive capacitance material;

a second insulating material disposed over the first insulating material and between the first insulating material and a conductive layer, the second insulating material comprising a negative capacitance ferroelectric material

a third insulating material on the second insulating material, the third insulating material comprising the positive capacitance material; and

a fourth insulating material on the third insulating material, the fourth insulating material comprising the negative capacitance ferroelectric material.

9. The MOS varactor of claim 8 , wherein the positive capacitance material is a high-k dielectric material.

10. The MOS varactor of claim 8 , an absolute value of a capacitance of the negative capacitance ferroelectric material is greater than a capacitance of the positive capacitance material.

11. The MOS varactor of claim 8 , wherein the negative capacitance ferroelectric material is selected from the group consisting of lead zirconate titanate (PZT), HfZrO 2 and AlInN.

12. The MOS varactor of claim 8 , integrated into a mobile phone, a set top box, a music player, a video player, an entertainment unit, a navigation device, a computer, a hand-held personal communication systems (PCS) unit, a portable data unit, and/or a fixed location data unit.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 8, 2017
From: LU, YE; BAO, JUNJING; YANG, BIN
To: QUALCOMM INCORPORATED
Reel/Frame 044338/0078 →
Continuity (1)
Related Publication 20190103459A1 · Apr 4, 2019
Cited By (1)
US 12,382,621