Etchant and method for manufacturing display device using the same
An etchant includes about 8 wt % to about 12 wt % of nitric acid, about 3 wt % to about 8 wt % of alkylsulfonic acid, about 7 wt % to about 12 wt % of a sulfate, about 40 wt % to about 55 wt % of an organic acid, about 0.5 wt % to about 5 wt % of an organic acid salt, and a balance of water.
1. An etchant, including:
about 8 wt % to about 12 wt % of nitric acid;
about 3 wt % to about 8 wt % of alkylsulfonic acid;
about 7 wt % to about 12 wt % of a sulfate;
about 40 wt % to about 55 wt % of an organic acid;
about 0.5 wt % to about 5 wt % of an organic acid salt; and
a balance of water.
2. The etchant as claimed in claim 1 , wherein a ratio of the sulfate relative to the organic acid salt by weight is about 4 to about 6.
3. The etchant as claimed in claim 2 , wherein the alkylsulfonic acid includes at least one of methane sulfonic acid, ethane sulfonic acid, and propane sulfonic acid.
4. The etchant as claimed in claim 3 , wherein the alkylsulfonic acid is methane sulfonic acid.
5. The etchant as claimed in claim 4 , wherein the organic acid includes at least one of acetic acid, citric acid, glycolic acid, malonic acid, lactic acid, and tartaric acid.
6. The etchant as claimed in claim 5 , wherein the organic acid includes the acetic acid and the citric acid.
7. The etchant as claimed in claim 6 , wherein the organic acid salt includes at least one of an acetate salt, a citrate salt, a glycolate salt, a malonate salt, a lactate salt, and a tartrate salt.
8. The etchant as claimed in claim 7 , wherein the organic acid salt includes the acetate salt or the citrate salt.
9. The etchant as claimed in claim 8 , wherein the sulfate includes at least one of potassium bisulfate, sodium bisulfate, and magnesium sulfate.
10. A method of manufacturing a display device, the method including:
forming a transistor and a pad on a substrate;
forming a planarization layer on the transistor;
forming a first electrode material layer on the planarization layer and the pad;
etching the first electrode material layer using an etchant to form a first electrode connected to the transistor;
forming a pixel defining layer having an opening overlapping with the first electrode on the first electrode;
forming a light emitting member on the first electrode in the opening; and
forming a second electrode on the light emitting member,
wherein the etchant includes:
about 8 wt % to about 12 wt % of nitric acid,
about 3 wt % to about 8 wt % of alkylsulfonic acid,
about 7 wt % to about 12 wt % of a sulfate,
about 40 wt % to about 55 wt % of an organic acid,
about 0.5 wt % to about 5 wt % of an organic acid salt, and
a balance of water.
11. The method as claimed in claim 10 , wherein
the first electrode material layer includes:
a lower electrode material layer including a transparent conductive material;
a middle electrode material layer on the lower electrode material layer, the middle electrode material layer including silver or a silver alloy material; and
an upper electrode material layer on the middle electrode material layer, the upper electrode material layer including the transparent conductive material.
12. The method as claimed in claim 11 , wherein in forming the first electrode,
the etchant batch-etches the lower electrode material layer, the middle electrode material layer, and the upper electrode material layer.
13. The method as claimed in claim 12 , wherein a ratio of the sulfate relative to the organic acid salt by weight is about 4 to about 6.
14. The method as claimed in claim 13 , wherein the alkylsulfonic acid includes at least one of methane sulfonic acid, ethane sulfonic acid, and propane sulfonic acid.
15. The method as claimed in claim 14 , wherein the alkylsulfonic acid is the methane sulfonic acid.
16. The method as claimed in claim 15 , wherein the organic acid includes at least one of acetic acid, citric acid, glycolic acid, malonic acid, lactic acid, and tartaric acid.
17. The method as claimed in claim 16 , wherein the organic acid includes the acetic acid and the citric acid.
18. The method as claimed in claim 17 , wherein the organic acid salt includes at least one of an acetate salt, a citrate salt, a glycolate salt, a malonate salt, a lactate salt, and a tartrate salt.
19. The method as claimed in claim 18 , wherein the organic acid salt includes the acetate salt or the citrate salt.
20. The method as claimed in claim 19 , wherein the sulfate includes at least one of potassium bisulfate, sodium bisulfate, and magnesium sulfate.