Semiconductor device and method for fabricating the same

1. A semiconductor device comprising:

a heat dissipation plate comprising a first region and a second region;

a first element disposed on the heat dissipation plate in the first region; and

a second element disposed on the heat dissipation plate in the second region,

wherein the first element comprises a first substrate,

the second element comprises a second substrate,

the first substrate comprises a material different from a material of the second substrate,

the first substrate contacts the heat dissipation plate, and

the second element is bonded directly to the heat dissipation plate by a flip-chip bonding manner.

2. The semiconductor device of claim 1 , wherein the first substrate comprises silicon, the second substrate comprises gallium nitride, and the heat dissipation plate comprises diamond.

3. The semiconductor device of claim 2 , wherein the first element comprises a silicon field effect transistor, and

the second element comprises a gallium nitride field effect transistor.

4. The semiconductor device of claim 1 , wherein the first element further comprises a first source electrode, a first drain electrode, and a first gate electrode between the first source electrode and the first drain electrode, which are disposed on the first substrate,

the second element further comprises a second source electrode, a second drain electrode, and a second gate electrode between the second source electrode and the second drain electrode, which are disposed on the second substrate, and

the second source electrode, the second drain electrode, and the second gate electrode are disposed between the second substrate and the heat dissipation plate.

5. The semiconductor device of claim 4 , further comprising:

a first line contacting the first source electrode to extend to a surface of the heat dissipation plate in the second region; and

a second line contacting the first drain electrode to extend to the surface of the heat dissipation plate in the second region,

wherein one of the second source electrode, the second drain electrode, and the second gate electrode is connected to the first line, and

another of the second source electrode, the second drain electrode, and the second gate electrode is connected to the second line.

6. The semiconductor device of claim 5 , wherein the first line and the second line cover a side surface of the first substrate.

7. The semiconductor device of claim 1 , wherein the first substrate does not cover the heat dissipation plate in the second region so as to expose a surface of the heat dissipation plate in the second region.

8. The semiconductor device of claim 1 , wherein the heat dissipation plate comprises diamond.

9. The semiconductor device of claim 1 , wherein the heat dissipation plate further comprises a third region spaced apart from the first region with the second region between the first region and the third region,

the semiconductor device further comprises a third element disposed in the third region, the third element having a third substrate, and

the first substrate and the third substrate comprise a same material.

10. The semiconductor device of claim 9 , wherein the second element comprises a gallium nitride field effect transistor,

the first element and the third element are electrically connected to the second element, and

each of the first element and the third element comprises one selected from a capacitor, an inductor, and a resistor.