Double MTJ stack with synthetic anti-ferromagnetic free layer and AlN bottom barrier layer
View Patent ↗A double magnetic tunnel junction (MTJ) stack for use in spin-transfer torque magnetoresistive random access memory (STT MRAM) is provided. The double MTJ stack includes a bottom tunnel barrier layer having hexagonal symmetry and composed of AlN, a magnetic free layer stack containing a synthetic anti-ferromagnetic coupling layer, and a top tunnel barrier layer having cubic symmetry. For such a double MTJ stack, the symmetry requirements for the tunnel barrier layers do not conflict anymore with the symmetry requirements for strong anti-ferromagnetic exchange. Thus, such a double MTJ stack can be used to provide performance enhancement such as faster switching times and lower write errors to a STT MRAM.
1. A double magnetic tunnel junction (MTJ) stack comprising:
a bottom tunnel barrier layer having hexagonal symmetry and composed of AlN located on a bottom magnetic pinned layer;
a magnetic free layer stack located on the bottom tunnel barrier layer, wherein the magnetic free layer stack comprises a first magnetic layer, a synthetic anti-ferromagnetic coupling layer, and a second magnetic layer;
a top tunnel barrier layer having cubic symmetry located on the second magnetic layer of the magnetic free layer stack; and
a top magnetic pinned layer located on the top tunnel barrier layer.
2. The double MTJ stack of claim 1 , wherein the first magnetic layer of the magnetic free layer stack has hexagonal symmetry, and the second magnetic layer of the magnetic free layer stack comprises a lower region having hexagonal symmetry and an upper region that has cubic symmetry or is amorphous.
3. The double MTJ stack of claim 2 , further comprising a symmetry transition region located between the lower region and the upper region of the second magnetic layer.
4. The double MTJ stack of claim 2 , wherein the bottom magnetic pinned layer has hexagonal symmetry and the top magnetic pinned layer has at least a lower region of cubic symmetry.
5. The double MTJ stack of claim 4 , wherein the top magnetic pinned layer has an upper region that has hexagonal symmetry and wherein a symmetry transition region is present between the lower region and the upper region of the top magnetic pinned layer.
6. The double MTJ stack of claim 1 , wherein the synthetic anti-ferromagnetic coupling layer is composed of Ru, Ir or Rh.
7. The double MTJ stack of claim 1 , wherein the top tunnel barrier layer is composed of magnesium oxide.
8. The double MTJ stack of claim 1 , wherein the top magnetic pinned layer has a lower region composed of a Fe-rich CoFeB alloy, and an upper region composed of one of MgO, Mg—Al oxide or Mg—Ir oxide.
9. The double MTJ stack of claim 1 , wherein the top magnetic pinned layer has a lower region composed of a Fe-rich CoFeB alloy, a middle symmetry transition region, and an upper region composed of a multilayer of Co/Pt or a multilayer of Co/Pt with one of Ru, Ir or Rh.
10. The double MTJ stack of claim 1 , wherein the second magnetic layer is composed of a lower region composed of Co or a Co alloy containing at least 50 atomic percent Co, a middle symmetry transition region, and an upper region of CoFeB or a CoFeB/Fe bilayer.
11. A spin-transfer torque magnetoresistive random access memory (STT MRAM) comprising:
a double magnetic tunnel junction (MTJ) stack located between a bottom electrode and a top electrode, wherein the double MTJ stack comprises:
a bottom tunnel barrier layer having hexagonal symmetry and composed of AlN located on a bottom magnetic pinned layer;
a magnetic free layer stack located on the bottom tunnel barrier layer, wherein the magnetic free layer stack comprises a first magnetic layer, a synthetic anti-ferromagnetic coupling layer, and a second magnetic layer;
a top tunnel barrier layer having cubic symmetry located on the second magnetic layer of the magnetic free layer stack; and
a top magnetic pinned layer located on the top tunnel barrier layer.
12. The STT MRAM of claim 11 , further comprising a metallic seed layer having hexagonal symmetry located between the bottom magnetic pinned layer and the bottom electrode.
13. The STT MRAM of claim 12 , wherein the metallic seed layer has a crystalline texture.
14. The STT MRAM of claim 11 , further comprising a MTJ cap layer located between the top magnetic pinned layer and the top electrode.
15. The STT MRAM of claim 11 , wherein the first magnetic layer of the magnetic free layer stack has hexagonal symmetry, and the second magnetic layer of the magnetic free layer stack comprises a lower region having hexagonal symmetry and an upper region that has cubic symmetry or is amorphous.
16. The STT MRAM of claim 15 , further comprising a symmetry transition region located between the lower region and the upper region of the second magnetic layer.
17. The STT MRAM of claim 15 , wherein the bottom magnetic pinned layer has hexagonal symmetry and the top magnetic pinned layer has at least a lower region of cubic symmetry.
18. The STT MRAM of claim 17 , wherein the top magnetic pinned layer has an upper region that has hexagonal symmetry and wherein a symmetry transition region is present between the lower region and the upper region of the top magnetic pinned layer.
19. The STT MRAM of claim 11 , wherein the synthetic anti-ferromagnetic coupling layer is composed of Ru, Ir or Rh.
20. The STT MRAM of claim 11 , wherein the top tunnel barrier layer is composed of magnesium oxide.