Heterostructures and electronic devices derived therefrom
The advent of graphene and related 2D materials has recently led to a new technology: heterostructures based on these atomically thin crystals. The paradigm proved itself extremely versatile and led to rapid demonstration of tunnelling diodes with negative differential resistance, tunnelling transistors, photovoltaic devices and so on. In the present invention, the complexity and functionality of such van der Waals heterostructures is taken to the next level by introducing quantum wells (QWs) engineered with one atomic plane precision. We describe light-emitting diodes (LEDs) made by stacking metallic graphene, insulating hexagonal boron nitride and various semiconducting monolayers into complex but carefully designed sequences.
1. A graphene-based vertical heterostructure comprising at least the following layers in sequence:
a first graphene layer comprising graphene or modified graphene;
a first insulating layer;
a first TMDC layer;
a second insulating layer;
a second TMDC layer;
a third insulating layer; and
a second graphene layer comprising graphene or modified graphene;
wherein the layers are stacked to form a laminate structure.
2. A heterostructure as claimed in claim 1 , wherein at least one additional layer is present on a surface of the first graphene layer opposite the first insulating layer.
3. A heterostructure as claimed in claim 2 , wherein the at least one additional layer is selected from the group consisting of hexagonal boron nitride (hBN), SiO 2 and Si.
4. A heterostructure as claimed in claim 1 , wherein at least one additional layer is present on a surface of the second graphene layer opposite the third insulating layer.
5. A heterostructure as claimed in claim 1 , wherein the heterostructure is mounted on a substrate.
6. A heterostructure as claimed in claim 1 , wherein one or more component layers of the heterostructure is formed of a single crystal.
7. A heterostructure as claimed in claim 1 , wherein the graphene of at least one of the first graphene layer and the second graphene layer is pristine graphene.
8. A heterostructure as claimed in claim 1 , wherein the graphene of at least one of the first graphene layer and the second graphene layer is chemically modified graphene.
9. A heterostructure as claimed in claim 1 , wherein the TMDC is selected from the group consisting of: MoS 2 , WS 2 , WSe 2 , MoSe 2 , MoTe 2 , and WTe 2 .
10. A heterostructure as claimed in claim 1 wherein at least one insulating layer comprises hBN.
11. A heterostructure as claimed in claim 1 wherein each insulating layer comprises hBN.
12. A heterostructure as claimed in claim 1 wherein at least one insulating layer consists essentially of hBN.
13. A heterostructure as claimed in claim 1 wherein each insulating layer consists essentially of hBN.
14. A graphene-based vertical heterostructure comprising at least the following layers in sequence:
a first graphene layer comprising graphene or modified graphene;
a first insulating layer;
a first TMDC layer;
a second insulating layer;
a second TMDC layer;
a third insulating layer;
a third TMDC layer;
a fourth insulating layer; and
the second graphene layer comprising graphene or modified graphene;
wherein the layers are stacked to form a laminate structure.
15. A graphene-based vertical heterostructure comprising at least the following layers in sequence:
a first graphene layer comprising graphene or modified graphene;
a first insulating layer;
a first TMDC layer;
a second insulating layer;
a second TMDC layer;
a third insulating layer;
a third TMDC layer;
a fourth insulating layer;
a fourth TMDC layer;
a fifth insulating layer; and
a second graphene layer comprising graphene or modified graphene;
wherein the layers are stacked to form a laminate structure.
16. A graphene-based vertical heterostructure comprising at least the following layers in sequence:
a first graphene layer comprising graphene or modified graphene;
a first insulating layer;
a first TMDC layer;
a second insulating layer;
a second TMDC layer;
a third insulating layer;
a third TMDC layer;
a fourth insulating layer;
a fourth TMDC layer;
a fifth insulating layer;
a fifth TMDC layer;
a sixth insulating layer; and
a second graphene layer comprising graphene or modified graphene;
wherein the layers are stacked to form a laminate structure.