Solvent containing anitmicrobial hard surface cleaning compositions
The need for a fast acting and broad spectrum antimicrobial composition which does not reduce surface shine and does not leave visible residues on the surface, which is also preferably suitable for surfaces which contact food, is met by formulating the antimicrobial composition according to the present invention.
1. An antimicrobial hard surface cleaning composition comprising:
a. from about 0.03% to about 10%, by weight of the composition, of a detersive surfactant;
b. from 0.05% to 8%, by weight of the composition, of an antimicrobial agent;
c. from about 0.1% to about 2.0%, by weight of the composition, of an amide of formula I:
R 1 —CO—NR 2 R 3 (I)
wherein R 1 is selected from the group consisting of linear or branched, substituted or unsubstituted C 6 -C 12 , each of R 2 and R 3 is independently selected from H, OH, a halogen, or C 1 -C 6 linear or branched, substituted or unsubstituted hydrocarbyl groups;
d. from about 0.1% to about 1.0%, by weight of the composition, of a glycol solvent, wherein the glycol solvent is selected from the group consisting of C 1 -C6 diols, C 1 -C6 triols, and mixtures thereof;
e. water; and
said composition has a pH from about 1.0 to about 6.0, wherein the antimicrobial agent is hydrogen peroxide, wherein the detersive surfactant comprises from 6 to 12 carbon atoms in the primary carbon chain.
2. The composition according to claim 1 , wherein the glycol solvent is selected from the group consisting of propylene glycol, dipropylene glycol, glycerin, 1,3 butylene glycol, ethylene glycol, diethylene glycol, triethylene glycol and mixtures thereof.
3. The composition according to claim 1 , wherein the amide of formula I is selected from the group consisting of N,N-dimethyl octanamide, N,N-dimethyl decanamide, N,N-dimethyl 9-decenamide, N,N-dimethyl 7-octenamide, octanohydroxamic acid, and mixtures thereof.
4. The composition according to claim 1 , wherein the composition further comprises amine oxide surfactant at a level of from about 0.01% to about 9.5% by weight of the composition.
5. The composition according to claim 4 , wherein the composition further comprises amine oxide surfactant at a level of from about 0.01% to about 2.0% by weight of the composition.
6. The composition according to claim 1 , wherein the composition comprises an acidifying agent, wherein the acidifying agent is selected from the group consisting of: organic acid, inorganic acid, and mixtures thereof.
7. The composition according to claim 1 , wherein the composition further comprises a polymer selected from the group consisting of: oxazoline homopolymer, oxazoline, copolymer, vinylpyrrolidone homopolymer (PVP);
polyethyleneglycol dimethylether (DM-PEG); a vinylpyrrolidone/dialkylaminoalkyl acrylate or methacrylate copolymers; a polystyrenesulphonate polymer (PSS); a poly vinyl pyridine-N-oxide (PVNO);
a polyvinylpyrrolidone/vinylimidazole copolymer (PVP-VI); a polyvinylpyrrolidone/polyacrylic acid copolymer (PVP-AA); a polyvinylpyrrolidone/vinylacetate copolymer (PVP-VA); a polyacrylic polymer or polyacrylicmaleic copolymer; and a polyacrylic or polyacrylic maleic phosphono end group copolymer; and mixtures thereof.
8. The composition according to claim 7 , wherein the composition comprises the polymer at a level of from about 0.005% to about 5.0% by weight of the total composition of the polymer.
9. A method for cleaning a hard surface, comprising the steps of:
a. optionally diluting the hard surface cleaning composition according to claim 1 ;
b. applying the hard surface cleaning composition to a hard surface; leaving the hard surface to dry without rinsing the surface.