Stereolithography device having a heating unit

1. A stereolithography device comprising

a trough for accommodating free-flowing, photopolymerizable material, said trough having a transparent trough bottom at least in an exposure region provided for exposures,

an exposure unit, which is arranged below the trough, for exposing a surface having a predefined contour for each layer and each successive layer to be formed inside the exposure region,

a construction platform suspended above the trough bottom on a lifting unit, on which a first layer cured by exposure is to be formed suspended thereon wherein a position of the construction platform above the trough bottom is adapted successively after each exposure of a layer to be formed, and,

a heating unit for heating the photopolymerizable material in the trough,

wherein the heating unit has a transparent, electrically conductive layer, which covers at least an entire area of the exposure region above the trough bottom, and which is provided with electrical contacts outside the exposure region and extending over opposing sides of the transparent, electrically conductive layer, with the electrical contacts connected to a controlled electrical supplier to enable heating of an entire area of the photopolymerizable material above the trough bottom in the exposure region by current flow through the transparent, electrically conductive layer.

2. The stereolithography device according to claim 1

wherein the transparent, electrically conductive layer is applied to a transparent plastic carrier film, which is in turn arranged above the trough bottom.

3. The stereolithography device according to claim 2 ,

wherein the transparent plastic carrier film for the transparent, electrically conductiver layer is made of polyethylene (PE), polypropylene (PP), polytetrafluoroethylene(PTFE), or polyfluoroethylene propylene (FEP).

4. The stereolithography device according to claim 1 ,

wherein the trough bottom in the exposure region is formed by a transparent plastic carrier film, above which the transparent, electrically conductive layer lies.

5. The stereolithography device according to claim 1 ,

wherein firstly a transparent silicone layer is applied above the trough bottom,

the transparent, electrically conductive layer is applied above the transparent silicon layer, and

a transparent plastic protective film is applied above the transparent, electrically conductive layer.

6. The stereolithography device according to claim 1 ,

wherein the transparent, electrically conductive layer lies above the trough bottom,

above the transparent, electrically conductive layer a transparent silicone layer is arranged, and

the transparent silicon layer is finally covered by a transparent plastic film.

7. The stereolithography device according to claim 1 ,

wherein a temperature sensor is arranged on the transparent, electrically conductive layer in heat conductive contact therewith, this sensor being connected to a controller, which is configured to control the current flow through the transparent, electrically conductive layer so that a desired temperature or a desired chronological temperature curve is caused in the transparent, electrically conductive layer above the trough bottom.

8. The stereolithography device according to claim 5 ,

wherein the transparent plastic protective film is made of polytetrafluoroethylene (PTFE) or polyfluoroethylene propylene (FEP).

9. The stereolithography device according to claim 1 ,

wherein the transparent, electrically conductive layer comprises one or more of indium tin oxide (ITO), tin oxide doped with fluorine (SnO2:F), tin oxide doped with aluminum (ZnO2:Al), aluminum zinc oxide (AZO), tin oxide doped with antimony (SnO2:Sb), graphene or other electrically conductive carbon compounds, electrically conductive polymers, or another metallic compound.

10. The stereolithography device according to claim 1 ,

wherein the transparent, electrically conductive layer has a sheet resistance in a range of 1-1000 Ω□.

11. The stereolithography device according to claim 1 ,

wherein electrical heating units are also provided on the trough bottom on regions outside the exposure region.

12. The stereolithography device according claim 11 ,

wherein the transparent, electrically conductive layer extends beyond the exposure region above the trough bottom.