High throughput, high resolution optical metrology for reflective and transmissive nanophotonic devices
View Patent ↗The present disclosure regards a large area functional metrology system for inspecting nanophotonic devices. The large area functional metrology system can include one or more light sources, optical components such as lenses and polarizers, and one or more camera sensors. The light source can irradiate light onto a nanophotonic device while the optical components can guide the light through the system and modulate states of the light. The camera sensor can record images of the nanophotonic device interacting with the irradiated light. The images can be taken as a function of one or more states. The system can also include a detector which can processes the images in order to detect defects. The defects can then be classified using one or more defect signatures. Based on this classification, the root causes of the defects can be automatically identified.
1. A large area functional metrology system for inspecting a nanophotonic device, the large area functional metrology system comprising:
a light source configured to irradiate light on a portion of a nanophotonic device;
an optical component;
a camera sensor to record an image of a portion of the nanophotonic device subjected to the light irradiating from the light source,
wherein the image is taken as a function of one or more states;
a detector to process the image to detect one or more defects in the nanophotonic device; and
a computational device to link the one or more defects to a root-cause corresponding to a deviation from a nanofabrication process.
2. The large area functional metrology system of claim 1 , further comprising:
a computational device to calculate a nanophotonic property at one or more points in an area of the nanophotonic device as a function of the one or more states; and
a defect analyzer to use the nanophotonic property identified by the computational device to detect defects.
3. The large area functional metrology system of claim 1 , wherein the one or more states are defined and include one or more of the following: 1) spectral content of the light irradiating the nanophotonic device, 2) polarization content of the light irradiating the nanophotonic device, 3) angle of incidence that the light irradiating the nanophotonic device makes with a surface of the nanophotonic device, 4) viewing angle of the camera sensor, 5) range of acceptance angles of the camera sensor, 6) spectral content of interacted light reflected from the nanophotonic device and irradiating the camera sensor, or 7) polarization content of the interacted light irradiating the camera sensor.
4. The large area functional metrology system of claim 1 , wherein the nanophotonic device has a minimum feature size on an order of a wavelength of the light irradiated on the nanophotonic device and wherein a geometry or material property of features of the nanophotonic device provide one or more nanophotonic properties in response to the light irradiated by the light source.
5. The large area functional metrology system of claim 4 , wherein the one or more nanophotonic properties include at least one of the following: 1) transmittance, 2) reflectance, 3) absorptance, 4) diffraction efficiency, 5) scattering efficiency, 6) polarization efficiency, 7) polarization conversion efficiency, 8) haze, or 9) contrast ratio.
6. The large area functional metrology system of claim 5 , wherein the nanophotonic device is a nanofabricated polarizer and the one or more nanophotonic properties include transmittance at one or more states, the nanophotonic device is a nanofabricated polarizer and the one or more nanophotonic properties include contrast ratio at one or more states, the nanophotonic device is a metal mesh and the one or more nanophotonic properties include transmittance at one or more states, or the nanophotonic device is a metal mesh and the one or more nanophotonic properties include haze at one or more states.
7. The large area functional metrology system of claim 1 , wherein the camera sensor records a reference image from light from a reference, wherein the reference image is used to calculate a nanophotonic property.
8. The large area functional metrology system of claim 1 , wherein large area functional metrology system is part of a wafer-scale manufacturing system, roll-to-roll manufacturing system, or sheet-to-sheet manufacturing system creating the nanophotonic device.
9. The large area functional metrology system of claim 1 , wherein the nanophotonic device is a nanofabricated polarizer, a metal mesh grid, an anti-reflector, a substantially perfect absorber, a substantially perfect reflector, a nanowire array, a nanowire dispersion, a nanoparticle array, a nanoparticle dispersion, a diffractive optic, a metamaterial, or a nanostructural color device.
10. The large area functional metrology system of claim 1 , wherein a continuously rotating diffraction grating is used, and wherein widths of spectral bands are substantially dictated by an exposure time of the camera sensor and a speed of rotation of the diffraction grating to substantially eliminate time spent rotating the diffraction grating between adjacent spectral bands.
11. The large area functional metrology system of claim 1 , wherein the camera sensor moves synchronously with a moving substrate to substantially eliminate relative motion between the camera sensor and a substrate.
12. The large area functional metrology system of claim 1 , further comprising a support upon which the nanophotonic device is placed to substantially eliminate out of plane displacements that cause focusing blurs in the image taken by the camera sensor.
13. The large area functional metrology system of claim 1 , wherein the optical component includes a lens with depth of focus that substantially eliminates focusing blurs caused by out-of-plane displacements of a substrate.
14. The large area functional metrology system of claim 1 , further comprising a control system to identify a registration mark on a substrate of the nanophotonic device and adjust a focus plane of the camera sensor to substantially eliminate focusing blurs caused by out-of-plane displacement of the substrate.
15. A method for real-time monitoring of a nanofabrication process, the method comprising:
irradiating a light on a portion of a nanophotonic device;
recording an image of a portion of the nanophotonic device subjected to the light,
wherein the image is taken as a function of one or more states;
processing the image to detect one or more defects in the nanophotonic device; and
linking the one or more defects to a root-cause, wherein the root-cause is a deviation from a desired nanofabrication process.
16. The method of claim 15 , wherein the defect is a deviation from an intended performance of the nanophotonic device and causes an undesirable change in a nanophotonic property of the nanophotonic device.
17. The method of claim 15 , wherein the root-cause is from a J-FIL inkjet system error, a PFIL slot die process error, an imprinting process error, an etch process error, or a glancing angle metal deposition error.
18. The method of claim 15 , wherein the portion of the nanophotonic device is a first portion and the method further comprising:
irradiating a second light on the first portion or a second portion of the nanophotonic device;
recording a second image of the first portion or the second portion of the nanophotonic device subjected to the second light; and
processing the second image to detect one or more additional defects in the nanophotonic device.
19. The large area functional metrology system of claim 1 , wherein the root-cause is from at least one of an inkjet system error, a slot die process error, an imprinting process error, an etch process error and a glancing metal deposition error.