IP Library Granted Patent US 10,896,989
Granted Patent B2
US 10,896,989 · App. 15/575,339 · Granted Jan 19, 2021

High efficiency back contact type solar cell, solar cell module, and photovoltaic power generation system

Inventors: Ryo Mitta (Kamisu, JP); Hiroshi Hashigami (Annaka, JP); Takenori Watabe (Annaka, JP); Hiroyuki Ohtsuka (Nagano, JP)
Assignee: SHIN-ETSU CHEMICAL CO., LTD.
H01L31/0682H01L31/02366H01L31/022458H01L31/0516H01L31/1804Y02E10/547Y02P70/50
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Quick Facts
Patent No.
US 10,896,989
App. No.
15/575,339
Granted
Jan 19, 2021
Kind
B2
Abstract

In a back contact type solar cell in which an impurity diffusion layer where second conductive type impurities are diffused is formed on a back surface, as a non-light receiving surface, of a first conductive type semiconductor substrate, and an electrode in contact with the impurity diffusion layer is provided, a surface concentration of the impurities in the impurity diffusion layer is not less than 5×10 17 atms/cm 3 and not more than 5×10 19 atms/cm 3 , and a diffusion depth of the impurities in the impurity diffusion layer is not smaller than 1 μm and not larger than 2.9 μm from a top of the back surface. It is thereby possible to provide a high efficiency back contact type solar cell which can be manufactured by a simple method at low cost.

Claims (37)

1. A back contact type solar cell, comprising:

a first conductive type semiconductor substrate;

an impurity diffusion layer where second conductive type impurities are diffused, the impurity diffusion layer being on a back surface, as a non-light receiving surface, of the first conductive type semiconductor substrate; and

an electrode in contact with the impurity diffusion layer, wherein

a surface concentration of the impurities in the impurity diffusion layer is not smaller than 5×10 17 atms/cm 3 and not larger than 5×10 19 atms/cm 3 ,

a diffusion depth of the impurities in the impurity diffusion layer is not smaller than 1 μm and not larger than 2.9 μm from a top of the back surface,

a maximum value of an impurity concentration of the impurity diffusion layer is not lower than 7×10 17 atms/cm 3 and not higher than 7×10 19 atms/cm 3 ,

the impurity concentration of the impurity diffusion layer becomes the maximum value at a position not less than 0.1 μm and not more than 1 μm deep from the top of the back surface,

the electrode partially penetrates into the impurity diffusion layer by sintering, and a depth of the penetration is not smaller than 0.1 μm and not larger than 1.9 μm from the top of the back surface, and a cross-sectional area of the electrode is not smaller than 350 μm 2 and not larger than 1000 μm 2 .

2. The back contact type solar cell according to claim 1 , wherein

sheet resistance of the impurity diffusion layer is not smaller than 60Ω/□ and not larger than 150Ω/□.

3. The back contact type solar cell according to claim 1 , wherein

the electrode is a sintered body containing at least glass frit, silver, and aluminum.

4. The back contact type solar cell according to claim 1 , wherein the first conductive type is an n-type, and the second conductive type is a p-type.

5. A solar cell module, comprising:

a plurality of back contact type solar cells electrically connected to each other,

each of the plurality of back contact type solar cells comprising:

a first conductive type semiconductor substrate;

an impurity diffusion layer where second conductive type impurities are diffused, the impurity diffusion layer being on a back surface, as a non-light receiving surface, of the first conductive type semiconductor substrate; and

an electrode in contact with the impurity diffusion layer, wherein

a surface concentration of the impurities in the impurity diffusion layer is not smaller than 5×10 17 atms/cm 3 and not larger than 5×10 19 atms/cm 3 ,

a diffusion depth of the impurities in the impurity diffusion layer is not smaller than 1 μm and not larger than 2.9 μm from a top of the back surface,

a maximum value of an impurity concentration of the impurity diffusion layer is not lower than 7×10 17 atms/cm 3 and not higher than 7×10 19 atms/cm 3 ,

the impurity concentration of the impurity diffusion layer becomes the maximum value at a position not less than 0.1 μm and not more than 1 μm deep from the top of the back surface,

the electrode partially penetrates into the impurity diffusion layer by sintering, and a depth of the penetration is not smaller than 0.1 μm and not larger than 1.9 μm from the top of the back surface, and a cross-sectional area of the electrode is not smaller than 350 μm 2 and not larger than 1000 μm 2 .

6. A photovoltaic power generation system, comprising:

a plurality of solar cell modules electrically connected to each other,

each of the plurality of solar cell modules comprising a plurality of back contact type solar cells electrically connected to each other,

each of the plurality of back contact type solar cells comprising:

a first conductive type semiconductor substrate;

an impurity diffusion layer where second conductive type impurities are diffused, the impurity diffusion layer being on a back surface, as a non-light receiving surface, of the first conductive type semiconductor substrate; and

an electrode in contact with the impurity diffusion layer, wherein

a surface concentration of the impurities in the impurity diffusion layer is not smaller than 5×10 17 atms/cm 3 and not larger than 5×10 19 atms/cm 3 ,

a diffusion depth of the impurities in the impurity diffusion layer is not smaller than 1 μm and not larger than 2.9 μm from a top of the back surface,

a maximum value of an impurity concentration of the impurity diffusion layer is not lower than 7×10 17 atms/cm 3 and not higher than 7×10 19 atms/cm 3 ,

the impurity concentration of the impurity diffusion layer becomes the maximum value at a position not less than 0.1 μm and not more than 1 μm deep from the top of the back surface,

the electrode partially penetrates into the impurity diffusion layer by sintering, and a depth of the penetration is not smaller than 0.1 μm and not larger than 1.9 μm from the top of the back surface, and a cross-sectional area of the electrode is not smaller than 350 μm 2 and not larger than 1000 μm 2 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 17, 2017
From: MITTA, RYO; HASHIGAMI, HIROSHI; WATABE, TAKENORI; OHTSUKA, HIROYUKI
To: SHIN-ETSU CHEMICAL CO., LTD.
Reel/Frame 044169/0241 →
Continuity (1)
Related Publication 20190221700A1 · Jul 18, 2019