Adsorbent-assisted stabilization of highly reactive gases
A method of adsorbing a highly reactive gas onto an adsorbent material comprising adsorbing the highly reactive gas to the adsorbent material. The adsorbent material comprises at least one Lewis basic functional group, or pores of a size to hold a single molecule of the highly reactive gas, or inert moieties which are provided to the adsorbent material at the same time at the same time as the highly reactive gas, prior to adsorbing the highly reactive gas or after adsorbing the highly reactive gas, or the highly reactive gas reacts with moieties of the adsorbent material resulting in passivation of the adsorbent material. A rate of decomposition of the adsorbed highly reactive gas is lower than a rate of decomposition for the neat gas at equal volumetric loadings and equal temperatures for both the adsorbed highly reactive gas and the neat gas.
1. A method of adsorbing a highly reactive gas onto a metal-organic framework (MOF) comprising:
reacting an initial dose of the highly reactive gas with the MOF, wherein the initial dose of the highly reactive gas passivates the MOF in a first adsorption cycle so that a rate of decomposition of the adsorbed highly reactive gas during subsequent adsorption cycles is lower than a rate of decomposition of the adsorbed highly reactive gas during the first adsorption cycle; and
adsorbing an additional dose of the highly reactive gas to the MOF subsequent to the initial dose.
2. The method of claim 1 , wherein the adsorbed highly reactive gas is arsine (AsH 3 ), stibine (SbH 3 ), phosphine (PH 3 ), borane (BH 3 ), diborane (B 2 H 6 ), halides, germane, digermane, silane, disilane, hydrazine or nitrogen trifluoride.
3. The method of claim 1 , further comprising removing byproducts formed by the reaction of the initial dose of the highly reactive gas with the MOF prior to adsorbing the highly reactive gas to the MOF subsequent to the initial dose.
4. The method of claim 1 , further comprising raising at least one of temperature or pressure to accelerate passivation of the MOF.
5. A gas storage and dispensing apparatus for a highly reactive gas comprising:
a container; and
an adsorbent material located in the container, wherein the adsorbent material comprises:
inert moieties which do not chemically react with the highly reactive gas; and
wherein a combination of the adsorbent material and the inert moieties is configured to provide a rate of decomposition of the adsorbed highly reactive gas lower than a rate of decomposition for a neat highly reactive gas that is not adsorbed at equal volumetric loadings and equal temperature for both the adsorbed highly reactive gas and the neat highly reactive gas.
6. The apparatus of claim 5 , wherein the adsorbent material comprises a metal-organic framework (MOF).
7. The apparatus of claim 5 , wherein the adsorbent material comprises a porous organic polymer (POP).
8. The apparatus of claim 5 , wherein the adsorbent material comprises activated carbon.
9. The apparatus of claim 5 , wherein the adsorbent material further comprises:
at least one Lewis basic functional group; or
pores of a size to hold a single molecule of the highly reactive gas.
10. The apparatus of claim 5 , wherein the adsorbed highly reactive gas is arsine (AsH 3 ), stibine (SbH 3 ), phosphine (PH 3 ), borane (BH 3 ), diborane (B 2 H 6 ), halides, germane, digermane, silane, disilane, hydrazine or nitrogen trifluoride.