IP Library Granted Patent US 10,968,340
Granted Patent B1
US 10,968,340 · App. 15/883,800 · Granted Apr 6, 2021

Electrically conductive, high strength, high temperature polymer composite for additive manufacturing

Inventors: Javed Abdurrazzaq Mapkar (Northville, MI); Richard Mauro de Luna (Fontana, CA)
Assignee: Eaton Intelligent Power Limited
C08L27/18B29C48/29B29C64/124B29C70/023B29C70/882C08K3/041C08K3/042C08K3/08C08L77/00C08L79/08C08L81/04C08L81/06C08L83/04B29K2071/00B29K2077/00B29K2507/04B29K2509/08C08K2003/085C08K2003/0806C08K2201/001C08K2201/005
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Quick Facts
Patent No.
US 10,968,340
App. No.
15/883,800
Granted
Apr 6, 2021
Kind
B1
Abstract

A composite material for use as a deposition material in an additive manufacturing system comprises a polymer component, a filler component, and an extrudability component. The extrudability component is present in the composite material is an amount of from 0.05 wt % to 10 wt % based on the weight of the composite material, and can comprise polyhedral oligomeric silsesquioxane (POSS). The polymer component comprises a high temperature polymer such as an engineering polymer or a high performance polymer. The filler component comprises at least one of a conductive component and a strengthening component. In some cases, the conductive component is present in an amount such that the composite material is formed as one of an electrostatic discharge (ESD) material and an EMI/EMC shielding material. The composite material can be deposited in a liquid state on a substrate using an additive manufacturing system, to produce a three-dimensional object.

Claims (45)

1. An electrically conductive deposition material extrudable in a fluid state for deposition via an additive manufacturing system, the deposition material comprising:

a polymer component in an amount of from 30 wt % to 99.85 wt % based on the weight of the deposition material;

wherein the polymer component comprises a high temperature polymer;

a filler component in an amount of from 0.1 wt % to 60 wt % based on the weight of the deposition material;

wherein the filler component comprises a strengthening component and a conductive component; and

an extrudability component in an amount of from 0.05 wt % to 10 wt % based on the weight of the deposition material;

wherein the extrudability component includes a rheological component and a dispersion component;

wherein the rheological component is polyhedral oligomeric silsesquioxane (POSS) and the dispersion component is a silane compound such that, in the liquid state, the deposition material is characterized by the filler component uniformly distributed in the polymer component; and

wherein the electrically conductive deposition material has an electrical resistance of from 1×10 1 ohms to 1×10 4 ohms.

2. The deposition material of claim 1 , wherein the high temperature polymer is selected from the group consisting of nylon, polyamide 12 (PA12), polyphthalamide (PPA), polyphenylene sulfide (PPS), polyphenylsulfone (PPSU), polyetherimide (PEI), polyamide-imide (PAI), ethylene tetrafluoroethylene (ETFE), fluorinated ethylene propylene (FEP), polyaryletherketone (PAEK), polyetherketone (PEK), polyetherketoneketone (PEKK), polyetheretherketone (PEEK), and combinations thereof.

3. The deposition material of claim 1 , wherein the extrudability component is in an amount of from 0.05 wt % to 5 wt % based on the weight of the deposition material.

4. The deposition material of claim 1 , wherein the extrudability component is in an amount of from 0.1 wt % to 3 wt % based on the weight of the deposition material.

5. The deposition material of claim 1 , wherein the filler component is in an amount of from 0.5 wt % to 29 wt % based on the weight of the deposition material.

6. The deposition material of claim 1 , wherein the filler component comprises the conductive component in an amount of from 0.1 wt % to 10 wt % based on the weight of the deposition material.

7. The deposition material of claim 1 , wherein the filler component comprises the conductive component in an amount of from 0.5 wt % to 4 wt % based on the weight of the deposition material.

8. The deposition material of claim 1 , wherein the strengthening component is selected from the group consisting of carbon fibers, glass fibers, basalt fibers, Kevlar fibers, and combinations thereof.

9. The deposition material of claim 1 , wherein the filler component comprises the strengthening component in an amount of from 5 wt % to 50 wt % based on the weight of the deposition material.

10. The deposition material of claim 1 , wherein the filler component comprises the strengthening component in an amount of from 5 wt % to 25 wt % based on the weight of the deposition material.

11. The deposition material of claim 1 , wherein the filler component comprises:

the conductive component in an amount of from 0.1 wt % to 10 wt % based on the weight of the deposition material; and

the strengthening component in an amount of from 5 wt % to 50 wt % based on the weight of the deposition material.

12. The deposition material of claim 1 , wherein the filler component comprises:

the conductive component in an amount of from 0.5 wt % to 4 wt % based on the weight of the deposition material; and

the strengthening component in an amount of from 5 wt % to 25 wt % based on the weight of the deposition material.

13. The deposition material of claim 1 , wherein the POSS component is one of trisilanol phenyl POSS and trisilanol isobutyl POSS.

14. The deposition material of claim 1 , the silane compound includes one of trichlorosilane (SiHCl3), tetramethylsilane (Si(CH3)4), and tetraethoxysilane (Si(OC2H5)4).

15. The deposition material of claim 1 , the conductive component including:

a first conductive component selected from the group consisting of carbon nanotubes, graphene, carbon black, and combinations thereof; and

a second conductive component selected from the group consisting of silver nanoparticles, copper nanoparticles and combinations thereof.

16. The deposition material of claim 1 , wherein the deposition material is an electromagnetic interference/electromagnetic compatibility (EMI/EMC) shielding material.

17. The deposition material of claim 1 , wherein the deposition material solidified from the liquid state after deposition via the additive manufacturing system is characterized by a tensile strength from 50 MPa to 200 MPa.

18. The deposition material of claim 1 , wherein the deposition material solidified from the liquid state, after deposition via the additive manufacturing system, is configured as an electrical circuit for conducting current to an electrical component.

19. An electrically conductive deposition material extrudable in a fluid state for deposition via an additive manufacturing system, the deposition material comprising:

a polymer component in an amount of from 30 wt % to 99.85 wt % based on the weight of the deposition material;

wherein the polymer component comprises a high temperature polymer;

a filler component in an amount of from 0.1 wt % to 60 wt % based on the weight of the deposition material;

wherein the filler component comprises a strengthening component and a conductive component;

the conductive component including:

a first conductive component selected from the group consisting of carbon nanotubes, graphene, carbon black, and combinations thereof; and

a second conductive component selected from the group consisting of silver nanoparticles, copper nanoparticles and combinations thereof;

an extrudability component in an amount of from 0.05 wt % to 10 wt % based on the weight of the deposition material;

wherein the extrudability component includes a rheological component and a dispersion component;

wherein the rheological component is polyhedral oligomeric silsesquioxane (POSS) and the dispersion component is a silane compound such that, in the liquid state, the deposition material is characterized by the filler component uniformly distributed in the polymer component; and

wherein the electrically conductive deposition material has an electrical resistance of from 1×10 5 ohms to 1×10 8 ohms.

20. The deposition material of claim 19 , wherein the deposition material is an electrostatic discharge (ESD) material.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 11, 2019
From: EATON CORPORATION
To: EATON INTELLIGENT POWER LIMITED
Reel/Frame 048855/0626 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 11, 2018
From: EATON CORPORATION
To: EATON INTELLIGENT POWER LIMITED
Reel/Frame 046316/0895 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2018
From: MAPKAR, JAVED ABDURRAZZAQ; DE LUNA, RICHARD MAURO
To: EATON CORPORATION
Reel/Frame 044779/0995 →
Continuity (1)
Provisional Application 62452590 · Jan 31, 2017
Cited By (7)
US 12,187,904 US 12,226,983 US 12,384,097 US 12,434,434 US 12,441,049 US 12,497,523 US 12,503,544