Semiconductor device and method of manufacturing the same
A semiconductor device for suppressing a variation in characteristics caused by a current flowing at the time of breakdown is disclosed. The first power MOS transistor Q 1 and the column CLM are formed in the first element region FCM defined in the epitaxial layer NEL, and the second power MOS transistor Q 2 is formed in the second element region RCM. The first power MOS transistor Q 1 includes a first trench gate electrode TGE 1 , and the second power MOS transistor Q 2 includes a second trench gate electrode TGE 2 . The depth GDP 1 of the first trench gate electrode TGE 1 is shallower than the depth GDP 2 of the second trench gate electrode TGE 2.
1. A semiconductor device comprising:
a semiconductor substrate having i) first region, ii) a second region, and iii) a drain region, the second region being different from the first region such that the first region and the second region are spaced apart from each other, the semiconductor substrate being formed of a first conductivity type;
a first semiconductor layer formed on the semiconductor substrate, the first semiconductor layer being formed of the first conductive type;
a first MOS transistor formed in the first region of the semiconductor substrate; and
a second MOS transistor formed in the second region of the semiconductor substrate,
wherein the first MOS transistor includes:
a first trench gate electrode formed so as to be embedded in a first trench formed in the first semiconductor layer via a first gate insulating film;
a first base region formed of a second semiconductor layer of a second conductivity type opposite to the first conductivity type and located on a side of the first trench;
a first source region formed of a third semiconductor layer of the first conductive type and formed in the second semiconductor layer; and
a column region formed of a fourth semiconductor layer of the first conductive layer and formed in a lower portion of the base region,
wherein the second MOS transistor includes:
a second trench gate electrode formed so as to be embedded in a second trench formed in the first semiconductor layer via a second gate insulating film;
a second base region formed of a fifth semiconductor layer of the second conductivity type opposite and located on a side of the second trench; and
a second source region formed of a sixth semiconductor layer of the first conductive type and formed in the fifth semiconductor layer; and
wherein a depth of the first trench is shallower than a depth of the second trench in a thickness direction of the semiconductor substrate,
wherein a width of the first trench gate electrode is narrower than a width of the second trench gate electrode, and
wherein the first trench gate electrode and the second trench gate electrode are commonly connected by a trench gate wiring.
2. The semiconductor device according to claim 1 , wherein a bottom of the column region is formed at a position deeper than a depth of the second trench in the thickness direction of the semiconductor substrate.
3. The semiconductor device according to claim 1 , wherein the drain region is a common drain region of the first and second MOS transistors.
4. The semiconductor device according to claim 3 , wherein source-drain paths of the first and second MOS transistors are connected in series between an external power supply and a load.