Heat-curable resin composition and semiconductor device
Provided are a resin composition capable of yielding a cured product exhibiting a superior heat resistance over a long period of time, and a superior reflow resistance due to a low water absorption rate even at a high temperature; and a semiconductor device encapsulated by such cured product. The resin composition is a heat-curable resin composition containing: (A) an organopolysiloxane having, in one molecule, at least one cyclic imide group and at least one siloxane bond; (B) an inorganic filler; and (C) a radical polymerization initiator. The semiconductor device is encapsulated by the cured product of such heat-curable resin composition.
1. A heat-curable resin composition comprising:
(A) an organopolysiloxane having, in one molecule, at least one cyclic imide group and at least one siloxane bond;
(B) an inorganic filler; and
(C) a radical polymerization initiator;
wherein the component (A) comprises at least (A-2) or comprises (A-2) and (A-1):
(A-1) a cyclic imide group-containing organopolysiloxane represented by the following average composition formula (1)
wherein R 1 independently represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, or a group represented by the following general formula (2) or (3); at least one R 1 is a group represented by the following general formula (2) or (3); a represents an integer of not smaller than 2; b represents an integer of not smaller than 0; c represents an integer of not smaller than 0; d represents an integer of not smaller than 0; a, b, c and d satisfy 2≤a+b+c+d 1,000,
wherein each of R 2 to R 7 independently represents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; R 3 and R 4 may bond together to form a ring; R 6 and R 7 may bond together to form a ring; each of m and n represents an integer of 0 to 3; each of X and Y represents a substituted or unsubstituted divalent hydrocarbon group that has 1 to 10 carbon atoms, and may have a hetero atom(s); broken lines represent connections to silicon atoms in the formula (1);
(A-2) a cyclic imide group-containing organopolysiloxane represented by the following average composition formula (1′)
wherein R 11 independently represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, or a group represented by the following general formula (2), (3) or (4); at least two R 11 groups bond together to form a structure represented by the following general formula (4); a′ represents an integer of not smaller than 2; b′ represents an integer of not smaller than 0; c′ represents an integer of not smaller than 0; d′ represents an integer of not smaller than 0; a′, b′, c′ and d′ satisfy 2≤a′+b′+c′+d′≤1,000,
wherein each of R 2 to R 7 independently represents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; R 3 and R 4 may bond together to form a ring; R 6 and R 7 may bond together to form a ring; each of m and n represents an integer of 0 to 3; each of X and Y represents a substituted or unsubstituted divalent hydrocarbon group that has 1 to 10 carbon atoms, and may have a hetero atom(s); broken lines represent connections to the silicon atoms in the formula (1′),
wherein Z represents a substituted or unsubstituted divalent hydrocarbon group that has 1 to 10 carbon atoms, and may have a hetero group(s); and
wherein A in the general formula (4) of the component (A2) has any one of the following structures
wherein bonds in the above structural formulae that are yet unbonded to substituent groups are to be bonded to carbonyl carbons forming cyclic imide structures in the general formula (4).
2. The heat-curable resin composition according to claim 1 , wherein at least one of R's and/or R 11 s is an organic group having a maleimide structure represented by the following formula (3′)
wherein each of R 6 and R 7 represents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; R 6 and R 7 may bond together to form a ring; Y represents a substituted or unsubstituted divalent hydrocarbon group that has 1 to 10 carbon atoms, and may have a hetero atom(s); a broken line represents a connection to the silicon atoms in the formula (1) or (1′).
3. A semiconductor device encapsulated by a cured product of the heat-curable resin composition according to claim 1 .
4. The heat-curable resin composition according to claim 1 , wherein the component (A) comprises both (A-1) and (A-2).
5. The heat-curable resin composition according to claim 1 , wherein the component (A) comprises only (A-2).
6. The heat-curable resin composition according to claim 1 , wherein the cyclic imide group-containing organopolysiloxane (A-1) is a component represented by:
7. The heat-curable resin composition according to claim 1 , wherein the cyclic imide group-containing organopolysiloxane (A-2) is a component represented by:
wherein n=3.