IP Library Granted Patent US 11,118,260
Granted Patent B2
US 11,118,260 · App. 16/762,247 · Granted Sep 14, 2021

Zirconium alloy cladding with improved oxidation resistance at high temperature and method for manufacturing same

Inventors: Jung Hwan Park (Daegu, KR); Hyun Gil Kim (Daejeon, KR); Yang Il Jung (Daejeon, KR); Dong Jun Park (Daejeon, KR); Byoung Kwon Choi (Daejeon, KR); Young Ho Lee (Daejeon, KR); Jae Ho Yang (Sejong, KR)
Assignee: KOREA ATOMIC ENERGY RESEARCH INSTITUTE
C23C14/16B32B15/01C22C16/00C23C14/32C23C14/325G21C3/07C23C14/00C23C14/22C23C14/24Y02E30/30
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Quick Facts
Patent No.
US 11,118,260
App. No.
16/762,247
Granted
Sep 14, 2021
Kind
B2
Abstract

The present invention relates to a zirconium alloy cladding with improved oxidation resistance at a high temperature and a method of manufacturing the same. More particularly, the zirconium alloy cladding includes a zirconium alloy cladding; and a Cr—Al thin film coated on the cladding, wherein the thin film is deposited through arc ion plating and the content of Al in the thin film is 5% by weight to 20% by weight.

Claims (9)

1. A method of manufacturing a zirconium alloy cladding with improved oxidation resistance at a high temperature, the method comprising:

(a) manufacturing a target comprising Cr and Al; and

(b) depositing a Cr—Al thin film on a zirconium alloy cladding through arc ion plating in which a current and a bias voltage are applied to the target, wherein the content of Al in the target is 7% by weight to 23% by weight;

wherein, in step (b), the applied current is 30 A to 120 A and the applied bias voltage is 120 V to 400 V,

wherein, in step (b), a working pressure during the deposition is maintained at 5 mTorr to 20 mTorr, and

wherein an arithmetical average roughness (Ra) of the Cr—Al thin film deposited in step (b) is 5 μm or less.

2. The method according to claim 1 , wherein, in step (b), the deposition is performed at 200° C. to 300° C.

3. The method according to claim 1 , wherein, in step (b), the deposition is performed at a rate of 2 μm/h to 15 μm/h.

4. The method according to claim 1 , wherein, after the zirconium alloy cladding and the Cr—Al thin film deposited in step (b) is-being oxidized at 1200° C. for 2,000 seconds under a steam atmosphere condition, a weight increase of the zirconium alloy cladding and the Cr—Al thin film deposited in step (b) ranges 1 mg/dm 2 to 3,000 mg/dm 2 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 7, 2020
From: PARK, JUNG HWAN; KIM, HYUN GIL; JUNG, YANG IL; PARK, DONG JUN; CHOI, BYOUNG KWON; LEE, YOUNG HO; YANG, JAE HO
To: KOREA ATOMIC ENERGY RESEARCH INSTITUTE
Reel/Frame 052599/0218 →
Priority Claims (1)
KR 10-2017-0151660 · Nov 14, 2017 · national
Continuity (1)
Related Publication 20200283885A1 · Sep 10, 2020