X.5 layer substrate
X.5 layer substrates that do not use an embedded traces substrate process during formation may produce a high yield with relaxed L/S in a short manufacturing time (only 4× lamination process without a detach process) at a low cost. For example, a substrate may include an mSAP, two landing pads, two escape lines, two bump pads, and a photo-imageable dielectric layer on the mSAP patterned substrate.
1. A substrate comprising:
a modified semi-additive process (mSAP) patterned substrate;
a first landing pad on a first side of the mSAP patterned substrate;
a second landing pad on the first side of the mSAP patterned substrate proximate to the first landing pad;
a first escape line on the first side of the mSAP patterned substrate between the first landing pad and the second landing pad;
a second escape line on the first side of the mSAP patterned substrate proximate to the first escape line between the first landing pad and the second landing pad;
a photo-imageable dielectric layer on the first side of the mSAP patterned substrate, the photo-imageable dielectric layer configured to encapsulate the first escape line and the second escape line;
a first bump pad on the photo-imageable dielectric layer opposite the mSAP patterned substrate, the first bump pad extending through the photo-imageable dielectric layer to the first landing pad; and
a second bump pad on the photo-imageable dielectric layer opposite the mSAP patterned substrate, the second bump pad extending through the photo-imageable dielectric layer to the second landing pad,
wherein a first line, a second line, the first escape line and the second escape line are co-planar in a first plane, and the first landing pad and the second landing pad are co-planar in a second plane different from the first plane, and wherein the first landing pad is coupled to the first line and the second landing pad is coupled to the second line.
2. The substrate of claim 1 , further comprising a solder resist film on the photo-imageable dielectric layer, the solder resist film configured to encapsulate the first bump pad and the second bump pad.
3. The substrate of claim 1 , wherein the first escape line, the second escape line, the first bump pad, and the second bump pad are co-planar.
4. The substrate of claim 1 , wherein the first line, the second line, the first escape line and the second escape line have a same line spacing in the first plane.
5. The substrate of claim 1 , wherein the photo-imageable dielectric layer separates a fine line/spacing, L/S, region from a solder connection region.
6. The substrate of claim 1 , wherein the photo-imageable dielectric layer does not contain any reinforcement material or prepreg material.
7. The substrate of claim 1 , wherein the substrate is incorporated into a device selected from the group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle.
8. A substrate comprising:
means for support;
a first landing pad on a first side of the means for support;
a second landing pad on the first side of the means for support proximate to the first landing pad;
a first escape line on the first side of the means for support between the first landing pad and the second landing pad;
a second escape line on the first side of the means for support proximate to the first escape line between the first landing pad and the second landing pad;
means for insulation on the first side of the means for support, the means for insulation configured to encapsulate the first escape line and the second escape line;
a first bump pad on the means for insulation opposite the means for support, the first bump pad extending through the means for insulation to the first landing pad; and
a second bump pad on the means for insulation opposite the means for support, the second bump pad extending through the means for insulation to the second landing pad,
wherein a first line, a second line, the first escape line and the second escape line are co-planar in a first plane, and the first landing pad and the second landing pad are co-planar in a second plane different from the first plane, and wherein the first landing pad is coupled to the first line and the second landing pad is coupled to the second line.
9. The substrate of claim 8 , further comprising a solder resist film on the means for insulation, the solder resist film configured to encapsulate the first bump pad and the second bump pad.
10. The substrate of claim 8 , wherein the first escape line, the second escape line, the first bump pad, and the second bump pad are co-planar.
11. The substrate of claim 8 , wherein the first line, the second line, the first escape line and the second escape line have a same line spacing in the first plane.
12. The substrate of claim 8 , wherein the means for insulation separates a fine line/spacing, L/S, region from a solder connection region.
13. The substrate of claim 8 , wherein the means for insulation does not contain any reinforcement material or prepreg material.
14. The substrate of claim 8 , wherein the substrate is incorporated into a device selected from the group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle.
15. A method for manufacturing a substrate, the method comprising:
providing a modified semi-additive process (mSAP) patterned substrate;
forming a first landing pad on a first side of the mSAP patterned substrate;
forming a second landing pad on the first side of the mSAP patterned substrate proximate to the first landing pad;
forming a first escape line on the first side of the mSAP patterned substrate between the first landing pad and the second landing pad;
forming a second escape line on the first side of the mSAP patterned substrate proximate to the first escape line between the first landing pad and the second landing pad;
forming a photo-imageable dielectric layer on the first side of the mSAP patterned substrate, the photo-imageable dielectric layer configured to encapsulate the first escape line and the second escape line;
forming a first bump pad on the photo-imageable dielectric layer opposite the mSAP patterned substrate, the first bump pad extending through the photo-imageable dielectric layer to the first landing pad; and
forming a second bump pad on the photo-imageable dielectric layer opposite the mSAP patterned substrate, the second bump pad extending through the photo-imageable dielectric layer to the second landing pad,
wherein a first line, a second line, the first escape line and the second escape line are co-planar in a first plane, and the first landing pad and the second landing pad are co-planar in a second plane different from the first plane, and wherein the first landing pad is coupled to the first line and the second landing pad is coupled to the second line.
16. The method of claim 15 , further comprising forming a solder resist film on the photo-imageable dielectric layer, the solder resist film configured to encapsulate the first bump pad and the second bump pad.
17. The method of claim 15 , wherein the first escape line, the second escape line, the first bump pad, and the second bump pad are co-planar.
18. The method of claim 15 , wherein the first line, the second line, the first escape line and the second escape line have a same line spacing in the first plane.
19. The method of claim 15 , wherein the photo-imageable dielectric layer separates a fine line/spacing, L/S, region from a solder connection region.
20. The method of claim 15 , wherein the photo-imageable dielectric layer does not contain any reinforcement material or prepreg material.
21. The method of claim 15 , further comprising incorporating the substrate into a device selected from the group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle.
22. A non-transitory computer-readable medium comprising instructions that when executed by a processor cause the processor to perform a method, the method comprising:
providing a modified semi-additive process (mSAP) patterned substrate;
forming a first landing pad on a first side of the mSAP patterned substrate;
forming a second landing pad on the first side of the mSAP patterned substrate proximate to the first landing pad;
forming a first escape line on the first side of the mSAP patterned substrate between the first landing pad and the second landing pad;
forming a second escape line on the first side of the mSAP patterned substrate proximate to the first escape line between the first landing pad and the second landing pad;
forming a photo-imageable dielectric layer on the first side of the mSAP patterned substrate, the photo-imageable dielectric layer configured to encapsulate the first escape line and the second escape line;
forming a first bump pad on the photo-imageable dielectric layer opposite the mSAP patterned substrate, the first bump pad extending through the photo-imageable dielectric layer to the first landing pad; and
forming a second bump pad on the photo-imageable dielectric layer opposite the mSAP patterned substrate, the second bump pad extending through the photo-imageable dielectric layer to the second landing pad,
wherein a first line, a second line, the first escape line and the second escape line are co-planar in a first plane, and the first landing pad and the second landing pad are co-planar in a second plane different from the first plane, and wherein the first landing pad is coupled to the first line and the second landing pad is coupled to the second line.
23. The non-transitory computer-readable medium of claim 22 , further comprising forming a solder resist film on the photo-imageable dielectric layer, the solder resist film configured to encapsulate the first bump pad and the second bump pad.
24. The non-transitory computer-readable medium of claim 22 , wherein the first escape line, the second escape line, the first bump pad, and the second bump pad are co-planar.
25. The non-transitory computer-readable medium of claim 22 , wherein the first line, the second line, the first escape line and the second escape line have a same line spacing in the first plane.
26. The non-transitory computer-readable medium of claim 22 , wherein the photo-imageable dielectric layer separates a fine line/spacing, L/S, region from a solder connection region.
27. The non-transitory computer-readable medium of claim 22 , wherein the photo-imageable dielectric layer does not contain any reinforcement material or prepreg material.
28. The non-transitory computer-readable medium of claim 22 , further comprising incorporating the mSAP patterned substrate into a device selected from the group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle.